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Exposure apparatus, maintenance method, exposure method, and method for producing device

  • US 20080013064A1
  • Filed: 03/12/2007
  • Published: 01/17/2008
  • Est. Priority Date: 03/13/2006
  • Status: Active Grant
First Claim
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1. An exposure apparatus which exposes a substrate by irradiating an exposure light onto the substrate through a liquid, comprising:

  • a liquid immersion system which forms a liquid immersion area with the liquid on the substrate; and

    an exchange system which exchanges a liquid immersion member which constructs a part of the liquid immersion system and makes contact with the liquid forming the liquid immersion area.

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