Resonant scanning mirror

• US 20080013097A1
• Filed: 06/23/2006
• Published: 01/17/2008
• Est. Priority Date: 06/23/2006
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: E. del Puerto, Santiago
• Granted Patent: US 7,697,115 B2
• Time in Patent Office: Days
• US Class Current: 356/500
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70425 Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Abstract

A system and method allow for a more effective synchronous scanning mirror (SSM). A lithography apparatus comprises an illumination system, a patterning device, a substrate table, and a projection system. The illumination system conditions a beam of radiation received from a radiation source operating at a first frequency. The patterning device patterns the beam. The substrate table supports and scans a substrate at a scanning velocity. The projection system includes a scanning device including a reflective device and a plurality of flexures. The plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation. The scanning device is configured to scan the patterned beam onto a target area of the substrate The resonant frequency of the scanning device is substantially equal to the first frequency, and is synchronized with the scanning velocity.

Claims

1. A lithography apparatus, comprising:

an illumination system that conditions a beam of radiation received from a radiation source emitting pulses operating at a first frequency;

a patterning device that patterns the beam pulses;

a substrate table that supports and scans a substrate at a scanning velocity; and

a projection system including a scanning device including a reflective device and a plurality of flexures, the plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation, wherein the scanning device is configured to scan the patterned beam pulses onto a target area of the substrate, and

wherein the resonant frequency of the scanning device is substantially a same value as the first frequency, an angular deflection of the scanning device is synchronized with a position of the substrate table, and an amplitude of resonant motion is controlled to substantially match an angular velocity of the scanning device to the scanning velocity of the substrate table during each of the pulses.

2. The lithography apparatus of claim 1, wherein the plurality of flexures are aligned such that a center plane of each flexure intersects at the axis of rotation of the scanning device, the axis of rotation being located at a reflective surface of the scanning device.

3. The lithography apparatus of claim 1, wherein the plurality of flexures are made from steel, steel alloy, beryllium, beryllium alloy, titanium, or titanium alloy.

4. The lithography apparatus of claim 1, wherein the beam of radiation is incident at an angle with respect to the reflective device of about 30 degrees to 60 degrees.

5. The lithography apparatus of claim 1, wherein the reflective device comprises an elongated reflecting surface.

6. The lithography apparatus of claim 1, wherein the scanning device further comprises:

a driving system that is configured to cause the reflective device to resonate about the axis of rotation at the second frequency.

7. The lithography apparatus of claim 6, wherein the driving system comprises:

first and second magnets coupled to opposite ends of the reflective device; and

complementarily located first and second coils that receive an alternating current signal.

8. The lithography apparatus of claim 1, wherein the plurality of flexures comprise a plurality of curvilinear or arcuate flexures and center planes of each of the plurality of flexures intersect substantially at the axis of rotation of the reflective device.

9. The lithography apparatus of claim 1, wherein:

the scanning device has first and second oppositely directing ones of the reflective device each having a respective one of the axis of rotation, such that a selected one of the reflective devices is used to scan the patterned beam pulses onto the optical system.

10. The lithography apparatus of claim 9, wherein the scanning device further comprises:

a driving system having first and second pairs of electromagnets, wherein alternating ones of the first and second pairs of electromagnets are energized to allow for the resonating of the first and second reflective devices around the respective axes of rotation.

11. The lithography apparatus of claim 1, wherein the scanning device is coupled to the projection system via a isolation mass-flexure arrangement, such that vibrations caused by resonating of the scanning device are substantially eliminated.

12. The lithography apparatus of claim 11, wherein the scanning device is stimulated into resonance indirectly by actuators coupled at one end to the isolation mass and at the other end to the projection system, such that no driving forces are applied directly to the reflective device thus substantially eliminating distortion.

13. The lithography apparatus of claim 1, wherein the reflective device and the plurality of flexures comprise a monolithic structure.

14. The lithography apparatus of claim 1, wherein:

the projection system further comprises an optical system;

the scanning device is configured to scan the patterned beam pulses onto the optical system; and

the optical system is configured to project the patterned beam pulses onto the target area of the substrate.

19. The lithography apparatus of claim 9, further comprising two cylindrical air bearings supporting the scanning device at two nodes.

20. The lithography apparatus of claim 9, further comprising a planar air bearing supporting the scanning device at a planar face.

15. A device manufacturing method, comprising:

(a) producing a beam of radiation at a first frequency;

(b) scanning a substrate using a substrate stage at a scanning velocity;

(c) patterning the beam of radiation;

(d) resonating a reflective device of a scanning mirror about an axis of rotation at substantially the first frequency using flexures coupled to the reflective device; and

(e) synchronizing the scanning of the scanning mirror to both the first frequency and the scanning velocity, such that the patterned beam is directed onto a target portion of the substrate.

16. The method of claim 15, wherein step (d) comprises using linear flexures having center planes that cross at the axis of rotation.

17. The method of claim 15, wherein step (d) comprises using curvilinear or arcuate flexures having center planes that cross at the axis of rotation.

18. The method of claim 15, wherein before step (e), the patterned beam of radiation is scanned onto projection optics using the scanning mirror, such that the projection optics are utilized to project the patterned beam onto the target portion of the substrate.

21. A lithography apparatus, comprising:

an illumination system that conditions a beam of radiation received from a radiation source operating at a first frequency;

a patterning device that patterns the beam;

a substrate table that supports and scans a substrate at a scanning velocity; and

a projection system including a scanning device including a reflective device and a plurality of flexures, the plurality of flexures being configured to allow the reflective device to resonate about an axis of rotation, wherein the scanning device is configured to scan the patterned beam onto a target area of the substrate, and

wherein the resonant frequency of the scanning device is substantially a same value as the first frequency, and is synchronized with the scanning velocity.