METHOD FOR PROCESSING OUTER PERIPHERY OF SUBSTRATE AND APPARATUS THEREOF
First Claim
1. An apparatus for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the apparatus comprising:
- a jet nozzle that jets out the reactive gas toward a target spot of the outer peripheral part, in such a way that a jetting direction of the reactive gas is approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to an imaginary plane where the substrate should be located.
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Accused Products
Abstract
To enhance a removing efficiency of unnecessary matters on a peripheral part of a substrate (90) such as wafer and to prevent particles from adhering to the substrate (90).
A reactive gas is jetted out from a jet nozzle (75) toward a target spot (P) of the peripheral part of the substrate (90) in such a way that the reactive gas is made to flow approximately along a circumferential direction at the target spot (P) of the substrate (90) as viewed from a direction orthogonal to the substrate (90). Gases near the target spot (P) are sucked by a suction nozzle (76) along approximately the circumferential direction at a downstream side of the target spot (P).
36 Citations
18 Claims
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1. An apparatus for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the apparatus comprising:
a jet nozzle that jets out the reactive gas toward a target spot of the outer peripheral part, in such a way that a jetting direction of the reactive gas is approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to an imaginary plane where the substrate should be located. - View Dependent Claims (2, 3, 4)
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5. An apparatus for removing an unnecessary matter on an outer peripheral part of a substrate by contacting a reactive gas with the outer peripheral part, the apparatus comprising:
a suction nozzle that sucks gases near a target spot of the outer peripheral part in such a way that a sucking direction of the suction nozzle is approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to an imaginary plane where the substrate should be located. - View Dependent Claims (6)
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7. An apparatus for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the apparatus comprising:
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a jet nozzle that jets out the reactive gas toward a target spot of the outer peripheral part, in such a way that a jetting direction of the reactive gas is approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to an imaginary plane where the substrate should be located; and
a suction nozzle that sucks gases near the target spot at a downstream side of the target spot in such a way that a sucking direction of the suction nozzle is approximately along a direction that is the same as the jetting direction as viewed from the orthogonal direction. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15)
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16. A method for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the method comprising:
jetting out the reactive gas toward a target spot of the outer peripheral part of the substrate approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to the substrate.
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17. A method for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the method comprising:
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contacting the reactive gas with the target spot in the outer peripheral part of the substrate; and
sucking gases near the target spot approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to the substrate.
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18. A method for removing an unnecessary matter on an outer peripheral part of a substrate by a reactive gas, the method comprising:
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jetting out the reactive gas toward a target spot of the outer peripheral part of the substrate approximately along a circumferential direction at the target spot in the substrate as viewed from a direction orthogonal to the substrate; and
sucking gases near the target spot at a downstream side of the target spot to a direction that is substantially the same as the jetting direction as viewed from a direction orthogonal to the substrate.
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Specification