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Exposure Apparatus and Device Producing Method

  • US 20080018866A1
  • Filed: 04/14/2005
  • Published: 01/24/2008
  • Est. Priority Date: 04/19/2004
  • Status: Active Grant
First Claim
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1. An exposure apparatus that exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, comprising:

  • a liquid supply mechanism having a supply port from which the liquid flows substantially in parallel with a surface of the substrate located on an image plane side of the projection optical system and which supplies the liquid to the image plane side of the projection optical system.

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