Maintenance Method, Maintenance Device, Exposure Apparatus, and Device Manufacturing Method

• US 20080018867A1
• Filed: 12/05/2005
• Published: 01/24/2008
• Est. Priority Date: 12/06/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Fujiwara, Tomoharu, Nishii, Yasufumi, Shiraishi, Kenichi
• Granted Patent: US 7,804,576 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/2041 in the presence of a fluid, e.g. immersion; using fluid cooling means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
• CPC Class Codes: G03F 7/70975 Assembly, maintenance, transport or storage of apparatus

Abstract

An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

Claims

1. A maintenance method for an exposure apparatus in which a liquid immersion region is formed on a substrate and said substrate is irradiated with exposure light via a first liquid forming said liquid immersion region to expose said substrate, wherein

said exposure apparatus is provided with a nozzle member that has at least one of a supply outlet that supplies said first liquid and a collection inlet which recovers said first liquid, and

in order to clean said nozzle member, said nozzle member is immersed in a second liquid stored in a predetermined container.

2. A maintenance method apparatus according to claim 1, wherein

said exposure apparatus has a projection optical system, and

said substrate is irradiated with said exposure light via said projection optical system and said first liquid.

3. A maintenance method according to claim 2, wherein

said nozzle member is disposed in the vicinity of a first optical element which, among a plurality of optical elements constituting said projection optical system, is located nearest to the image plane of said projection optical system, and

said first optical element is immersed together with said nozzle member.

4. A maintenance method according to claim 2, wherein

said exposure apparatus has a supporting mechanism that supports said nozzle member in a predetermined positional relationship relative to said projection optical system, and

said nozzle member is immersed in a state such that said nozzle member is supported by said supporting mechanism.

5. A maintenance method according to claim 2, wherein

said exposure apparatus has a supporting mechanism that supports said nozzle member in a predetermined positional relationship relative to said projection optical system, and

said nozzle member is detached from said supporting mechanism and is then immersed.

6. A maintenance method according to claim 1, wherein said nozzle member is immersed in a state such that said container is connected to said nozzle member.

7. A maintenance method according to claim 1, wherein said nozzle member is immersed while said second liquid is being circulated by a circulation system including said container.

8. A maintenance method according to claim 1, wherein ultrasonic waves are applied to said second liquid in said container.

9. A maintenance method according to claim 1, wherein said first liquid and said second liquid differ from each other.

10. A maintenance method according to claim 9, wherein after immersing said nozzle member in said second liquid, said nozzle member is immersed in said first liquid.

11. A maintenance method according to claim 2, wherein

said exposure apparatus irradiates said substrate with said exposure light, in a state such that an optical path space between said projection optical system and said substrate is filled with said first liquid, and

said nozzle member is in contact with said first liquid that is in contact with said substrate.

12. A maintenance device for an exposure apparatus in which a liquid immersion region is formed on a substrate and said substrate is irradiated with exposure light via a first liquid of said liquid immersion region to expose said substrate, wherein

said exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies said first liquid and a collection inlet which recovers said first liquid, and

in order to clean said nozzle member, an immersion portion by which said nozzle member is immersed in a second liquid is provided.

13. A maintenance device according to claim 12, wherein

said exposure apparatus has a projection optical system, and

said exposure light is irradiated onto said substrate via said projection optical system and said first liquid.

14. A maintenance device according to claim 12, wherein a connecting portion that is connectable with an object in said exposure apparatus is provided.

15. A maintenance device according to claim 14, wherein said nozzle member is immersed in a state such that said connecting portion and said object are connected with each other.

16. A maintenance device according to claim 14, wherein said connecting portion is connectable with said nozzle member.

17. A maintenance device according to claim 12, wherein a supporting device that movably supports said immersion portion is provided.

18. A maintenance device according to claim 12, wherein said immersion portion includes a container that is capable of storing said second liquid.

19. A maintenance device according to claim 18, wherein a circulation system that circulates said second liquid in said container is provided.

20. A maintenance device according to claim 18, wherein an ultrasonic generator that applies ultrasonic waves to said second liquid in said container is provided.

21. A maintenance device according to claim 12, wherein said first liquid and said second liquid differ from each other.

22. A maintenance device according to claim 12, wherein

said exposure apparatus irradiates said illumination light onto said substrate, in a state such that an optical path space between said projection optical system and said substrate is filled with said first liquid, and

said nozzle member is in contact with said first liquid that is in contact with said substrate.

23. An exposure apparatus in which an optical path space on the light exit side of an optical element is filled with a first liquid and a substrate is irradiated with exposure light via said optical element and said first liquid to expose said substrate, said exposure apparatus comprising:

an immersion portion that immerses a predetermined member in a second liquid in order to clean, within said exposure apparatus, said predetermined member that comes into contact with said first liquid.

24. An exposure apparatus according to claim 23, further comprising:

a nozzle member that has at least one of a supply outlet which supplies said first liquid and a collection inlet that recovers said first liquid, wherein

said predetermined member includes said nozzle member.

25. An exposure apparatus according to claim 23, wherein said optical element is a portion of a projection optical system.

26. A device manufacturing method that uses an exposure apparatus in which an optical path space on the light exit side of an optical element is filled with a first liquid and a substrate is irradiated with exposure light via said optical element and said first liquid to expose said substrate, and said exposure apparatus includes:

an immersion portion that immerses a predetermined member in a second liquid in order to clean, within said exposure apparatus, said predetermined member that comes into contact with said first liquid.