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System and method to compensate for critical dimension non-uniformity in a lithography system

  • US 20080024744A1
  • Filed: 07/27/2006
  • Published: 01/31/2008
  • Est. Priority Date: 07/27/2006
  • Status: Active Grant
First Claim
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1. A system, comprising:

  • a source of radiation that produces a beam of radiation; and

    an optical system configured to transmit a first portion of the beam having a first polarization direction during a first portion of a cycle and a second portion of the beam having a second polarization direction during a second portion of the cycle.

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