Method of depositing a multilayer coating with a variety of oxide adhesion layers and organic layers
First Claim
1. A method of depositing multilayered coatings on a substrate, which coatings are tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, and wherein said multilayered coatings include at least one oxide-based layer and at least one organic-based layer.
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Abstract
An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.
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Citations
48 Claims
- 1. A method of depositing multilayered coatings on a substrate, which coatings are tailored to provide a particular characteristic behavior, wherein all layers of said multilayered coating are deposited from a vapor phase, and wherein said multilayered coatings include at least one oxide-based layer and at least one organic-based layer.
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5. (canceled)
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9-11. -11. (canceled)
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13-16. -16. (canceled)
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18-22. -22. (canceled)
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25. (canceled)
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27-30. -30. (canceled)
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31. A method of depositing a multilayered coating on a substrate from a vapor phase, wherein each layer deposition rate and a surface roughness of said multilayered coating are simultaneously controlled by controlling a total pressure in a processing chamber in which said coating is deposited, a partial pressure of at least one coating precursor, a temperature of a substrate on which said coating is deposited, and at least one temperature of a major processing apparatus surface inside said processing chamber.
- 32. A method of controlling the surface roughness of a multilayered organo-silicon-containing coating on a substrate, wherein said multilayered coating is deposited from a vapor phase, wherein at least one layer is formed using an organosilane precursor which is introduced into a coating deposition chamber in which said multilayered coating is deposited, followed by the introduction of water vapor, and wherein said surface roughness of said at least one layer is further controlled by controlling a total pressure in said deposition chamber, a partial pressure of at least one precursor, and a temperature of a substrate on which said coating is deposited.
- 36. A method of depositing a multilayered coating wherein an oxide-based layer thickness in direct contact with a substrate is controlled as a function of the chemical composition of said substrate, and wherein a SAM organic-based layer is deposited directly over said oxide-based layer, whereby an ability of said SAM organic-based layer to bond to said oxide-based layer is improved due to control of said oxide-based layer thickness.
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37. A method of depositing a multilayered coating over a substrate, comprising deposition of at least two oxide-based layers and at least one organic-based layer, where each layer is deposited from a vapor phase, wherein said oxide based layer and said organic-based layer are alternated, and wherein an oxide-based layer is deposited directly over a surface of said substrate.
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38-45. -45. (canceled)
Specification