Photomask manufacturing method and semiconductor device manufacturing method
First Claim
1. A photomask manufacturing method comprising:
- preparing a photomask in which a mask pattern is formed on a transparent substrate;
generating a pattern dimensional map by measuring a mask in-plane distribution of pattern dimensions;
generating a transmittance correction coefficient map by dividing a formation region of the pattern into a plurality of subregions and determining a transmittance correction coefficient for each subregion in accordance with a size of a pattern of said each subregion;
calculating a transmittance correction value of said each subregion on the basis of the pattern dimensional map and the transmittance correction coefficient map; and
changing a transmittance of the transparent substrate corresponding to said each subregion on the basis of the transmittance correction value.
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Abstract
This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation region into a plurality of subregions, and determining a transmittance correction coefficient for each of the plurality of subregions. The transmittance correction value of each subregion is calculated on the basis of the pattern dimensional map and the transmittance correction coefficient map. The transmittance of the transparent substrate corresponding to each subregion is changed on the basis of the transmittance correction value.
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Citations
19 Claims
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1. A photomask manufacturing method comprising:
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preparing a photomask in which a mask pattern is formed on a transparent substrate;
generating a pattern dimensional map by measuring a mask in-plane distribution of pattern dimensions;
generating a transmittance correction coefficient map by dividing a formation region of the pattern into a plurality of subregions and determining a transmittance correction coefficient for each subregion in accordance with a size of a pattern of said each subregion;
calculating a transmittance correction value of said each subregion on the basis of the pattern dimensional map and the transmittance correction coefficient map; and
changing a transmittance of the transparent substrate corresponding to said each subregion on the basis of the transmittance correction value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A photomask manufacturing method comprising:
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preparing a photomask in which a mask pattern formed from a halftone film is formed on a transparent substrate;
generating a transmittance correction coefficient map by dividing a formation region of the pattern into a plurality of subregions, calculating, for each subregion, a mask error enhancement factor indicating, when the pattern of the photomask is transferred onto a semiconductor wafer, a relationship between a dimensional fluctuation on the mask and a dimensional fluctuation on the wafer, selecting and using, as an MEF value indicating the mask error enhancement factor, a maximum MEF value of a plurality of patterns within each subregion, and determining a transmittance correction coefficient of said each subregion on the basis of the selected maximum MEF value;
generating a pattern dimensional map indicating a mask in-plane distribution of pattern dimensions by measuring the dimensions of the pattern for each subregion that is larger than the subregions divided in determining the transmittance correction coefficients;
calculating a transmittance correction value of said each subregion on the basis of the pattern dimensional map and the transmittance correction coefficient map; and
changing a transmittance of the transparent substrate corresponding to said each subregion on the basis of the transmittance correction value.
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11. A semiconductor device manufacturing method comprising:
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preparing a photomask in which a mask pattern is formed on a transparent substrate;
generating a pattern dimensional map by measuring a mask in-plane distribution of pattern dimensions;
generating a transmittance correction coefficient map by dividing a formation region of the pattern into a plurality of subregions and determining a transmittance correction coefficient for each subregion in accordance with a size of a pattern of said each subregion;
calculating a transmittance correction value of said each subregion on the basis of the pattern dimensional map and the transmittance correction coefficient map;
changing a transmittance of the transparent substrate corresponding to said each subregion on the basis of the transmittance correction value; and
transferring the pattern of the photomask onto a wafer using the photomask whose transmittance of the transparent substrate is changed. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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Specification