METHOD FOR FABRICATING A STRUCTURE FOR A MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICE
First Claim
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1. A method of fabricating a microelectromechanical systems (MEMS) device, the method comprising:
- forming at least one layer over a substrate, said layer comprising a sacrificial material;
patterning said sacrificial layer;
depositing an additional layer over said sacrificial layer; and
patterning said additional layer using said sacrificial layer as a photomask.
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Abstract
The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed; depositing a photosensitive layer over said one or a stack of layers; and passing light through said at least one aperture to expose said photosensitive layer.
158 Citations
30 Claims
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1. A method of fabricating a microelectromechanical systems (MEMS) device, the method comprising:
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forming at least one layer over a substrate, said layer comprising a sacrificial material;
patterning said sacrificial layer;
depositing an additional layer over said sacrificial layer; and
patterning said additional layer using said sacrificial layer as a photomask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method of forming a microelectromechanical systems (MEMS) device, the method comprising:
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providing a light-transmissive substrate;
providing a sacrificial layer over the substrate;
patterning the sacrificial layer to remove at least a portion of the sacrificial layer;
providing an additional layer over the sacrificial layer; and
patterning the additional layer by exposing the additional layer to light through the removed portion of the sacrificial layer. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27)
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28. A method of fabricating a microelectromechanical systems (MEMS) array, the method comprising:
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forming a transparent electrode over a substrate, the substrate permitting light to pass therethrough;
forming a sacrificial layer over said transparent electrode;
depositing an additional layer over said sacrificial layer; and
patterning said additional layer by exposing the additional layer to light through the substrate. - View Dependent Claims (29, 30)
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Specification