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Fine Treatment Agent and Fine Treatment Method Using Same

  • US 20080029487A1
  • Filed: 12/19/2005
  • Published: 02/07/2008
  • Est. Priority Date: 12/20/2004
  • Status: Active Grant
First Claim
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1. A fine treatment agent, which is used for the fine processing of a multilayer film including a tungsten containing film and a silicon compound containing film, comprising hydrogen fluoride, nitric acid and at least one of ammonium fluoride or ammonium chloride.

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