Charged Particle Beam System, Sample Processing Method, and Semiconductor Inspection System
First Claim
1. A charged particle beam system comprising:
- a sample stage movable with a sample mounted thereon;
a sample chamber enclosing the sample stage;
an electron beam column connected to the sample chamber and having an electron source and an electron beam optical system for focusing an electron beam drawn from the electron source and scanning and irradiating the sample with the electron beam;
an ion beam column connected to the sample chamber and having a nonmetal gas ion source and an ion beam optical system for irradiating the sample with an ion beam drawn from the gas ion source;
a sample signal detector for detecting a sample signal for generating a microscope image that is obtained by irradiating the sample with the electron beam from the electron beam column or the ion beam from the ion beam column;
an image generator for generating an electron microscope image or an ion microscope image by acquiring a detection signal from the sample signal detector;
an optical microscope disposed in the sample chamber such that an ion beam target position of the ion beam column is within the view field of the optical microscope; and
an image generator for generating an optical microscope image of the sample by acquiring condition data from the optical microscope.
2 Assignments
0 Petitions
Accused Products
Abstract
A charged particle beam system, a sample processing method, and a semiconductor inspection system enable an accurate detection of a particle in a film without causing LMIS contamination and allow observation with an electron microscope quickly. A particle 65 causing a defect in a film 66 that has been detected with a separate optical inspection system is detected with an optical microscope 43 based on position information acquired by the separate optical inspection system. A sample 31 is processed with a nonmetal ion beam 22 so as to allow observation of the particle 65 with an electron microscope image or an ion microscope image, or ultimate analysis of the particle 65 with an EDX.
45 Citations
17 Claims
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1. A charged particle beam system comprising:
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a sample stage movable with a sample mounted thereon; a sample chamber enclosing the sample stage; an electron beam column connected to the sample chamber and having an electron source and an electron beam optical system for focusing an electron beam drawn from the electron source and scanning and irradiating the sample with the electron beam; an ion beam column connected to the sample chamber and having a nonmetal gas ion source and an ion beam optical system for irradiating the sample with an ion beam drawn from the gas ion source; a sample signal detector for detecting a sample signal for generating a microscope image that is obtained by irradiating the sample with the electron beam from the electron beam column or the ion beam from the ion beam column; an image generator for generating an electron microscope image or an ion microscope image by acquiring a detection signal from the sample signal detector; an optical microscope disposed in the sample chamber such that an ion beam target position of the ion beam column is within the view field of the optical microscope; and an image generator for generating an optical microscope image of the sample by acquiring condition data from the optical microscope. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A semiconductor inspection system comprising:
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a sample stage movable with a semiconductor sample mounted thereon; a sample chamber enclosing the sample stage; an electron beam column connected to the sample chamber and having an electron source and an electron beam optical system for focusing an electron beam drawn from the electron source and scanning and irradiating the semiconductor sample with the electron beam; an ion beam column connected to the sample chamber and having a nonmetal gas ion source and an ion beam optical system for irradiating the semiconductor sample with an ion beam drawn from the gas ion source; a sample signal detector for detecting a sample signal for generating a microscope image that is obtained by irradiating the semiconductor sample with the electron beam from the electron beam column or the ion beam from the ion beam column; an image generator for generating an electron microscope image or an ion microscope image by acquiring a detection signal from the sample signal detector; an optical microscope disposed in the sample chamber such that an ion beam target position of the ion beam column is within the view field of the optical microscope; and an image generator for generating an optical microscope image of the semiconductor sample by acquiring condition data from the optical microscope.
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Specification