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POST VERTICAL INTERCONNECTS FORMED WITH SILICIDE ETCH STOP AND METHOD OF MAKING

  • US 20080029901A1
  • Filed: 08/31/2007
  • Published: 02/07/2008
  • Est. Priority Date: 06/30/2003
  • Status: Active Grant
First Claim
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1. A plurality of active elements comprising:

  • active elements having a minimum feature size less than about 0.25 micron; and

    at least one vertical interconnect having a smallest patterned dimension substantially the same as the minimum feature size.

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