COLOR FILTER AND FABRICATING METHOD THEREOF

• US 20080030657A1
• Filed: 11/30/2006
• Published: 02/07/2008
• Est. Priority Date: 08/04/2006
• Status: Active Grant

• Current Assignee: AU Optronics Corporation
• Original Assignee: AU Optronics Corporation
• Inventors: Wang, Chih-Haw, Wu, Pei-Hsun, Lan, Ying-Che, Hsu, Chia-Yang
• Granted Patent: US 7,595,512 B2
• Time in Patent Office: Days
• US Class Current: 349/106
• CPC Class Codes: G02F 1/133516 Methods for their manufacture, e.g. printing, electro-deposition or photolithography
• CPC Class Codes: G02F 2202/32 Photonic crystals

Abstract

A color filter including a substrate and a color filter layer is disclosed. The color filter layer is disposed on the substrate and includes a red photonic crystal structures, a green photonic crystal structure and a blue photonic crystal structure. The red photonic crystal structure includes a first defect resonance cavity and has multiple first holes surrounding the first defect resonance cavity. The green photonic crystal structure includes a second defect resonance cavity and has multiple second holes surrounding the second defect resonance cavity. The blue photonic crystal structure includes a third defect resonance cavity and has multiple third holes surrounding the third defect resonance cavity. Wherein, the hole diameter of the first holes is less than the hole diameter of the second holes, and the hole diameter of the second holes is less than the hole diameter of the third holes.

Claims

1. A color filter, comprising:

a substrate; and

a color filter layer, disposed on the substrate and comprising;

a red photonic crystal structure, comprising a first defect resonance cavity and having multiple first holes surrounding the first defect resonance cavity and multiple fourth holes in a periodic arrangement;

a green photonic crystal structure, comprising a second defect resonance cavity and having multiple second holes surrounding the second defect resonance cavity and the fourth holes in a periodic arrangement; and

a blue photonic crystal structure, comprising a third defect resonance cavity and having multiple third holes surrounding the third defect resonance cavity and the fourth holes in a periodic arrangement, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

2. The color filter according to claim 1, wherein the material of the color filter layer comprises dielectric material.

3. The color filter according to claim 1, further comprising a black matrix disposed on the substrate to define multiple pixel regions on the substrate.

4. The color filter according to claim 3, wherein the red photonic crystal structure, the green photonic crystal structure and the blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

5. The color filter according to claim 1, wherein the substrate comprises a transparent substrate.

6. A color filter, comprising:

a substrate; and

a color filter layer, disposed on the substrate and comprising;

a red photonic crystal structure, comprising multiple first defect resonance cavities and having multiple first holes surrounding the first defect resonance cavities and multiple fourth holes in a periodic arrangement, wherein the distance between two adjacent first defect resonance cavities is larger than or equal to three periodic intervals;

a green photonic crystal structure, comprising multiple second defect resonance cavities and having multiple second holes surrounding the second defect resonance cavities and the fourth holes in a periodic arrangement, wherein the distance between two adjacent second defect resonance cavities is larger than or equal to three periodic intervals; and

a blue photonic crystal structure, comprising multiple third defect resonance cavities and having multiple third holes surrounding the third defect resonance cavities and the fourth holes in a periodic arrangement, wherein the distance between two adjacent third defect resonance cavities is larger than or equal to three periodic intervals, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

7. The color filter according to claim 6, wherein the material of the color filter layer comprises dielectric material.

8. The color filter according to claim 6, further comprising a black matrix disposed on the substrate to define multiple pixel regions on the substrate.

9. The color filter according to claim 8, wherein the red photonic crystal structure, the green photonic crystal structure and the blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

10. The color filter according to claim 6, wherein the substrate comprises a transparent substrate.

11. A fabricating method of a color filter, comprising:

providing a substrate;

forming a photonic crystal material layer on the substrate; and

patterning the photonic crystal material layer to form a color filter layer, wherein the color filter layer comprises;

a red photonic crystal structure, comprising a first defect resonance cavity and having multiple first holes surrounding the first defect resonance cavity and multiple fourth holes in a periodic arrangement;

a green photonic crystal structure, comprising a second defect resonance cavity and having multiple second holes surrounding the second defect resonance cavity and the fourth holes in a periodic arrangement; and

a blue photonic crystal structure, comprising a third defect resonance cavity and having multiple third holes surrounding the third defect resonance cavity and the fourth holes in a periodic arrangement, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

12. The fabricating method of a color filter according to claim 11, wherein the material of the color filter layer comprises dielectric material.

13. The fabricating method of a color filter according to claim 11, further comprising forming a black matrix on the substrate to define multiple pixel regions on the substrate.

14. The fabricating method of a color filter according to claim 13, wherein the red photonic crystal structure, green photonic crystal structure and blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

15. The fabricating method of a color filter according to claim 11, wherein the substrate comprises a transparent substrate.

16. A color filter, comprising:

a substrate, comprising a reflective region and a transmissive region;

an organic material layer, disposed on the substrate and in the reflective region; and

a color filter layer, disposed on the substrate and covering the organic material layer;

the color filter layer comprising;

a red photonic crystal structure, comprising a first defect resonance cavity disposed in the transmissive region and having multiple first holes surrounding the first defect resonance cavity and multiple fourth holes in a periodic arrangement;

a green photonic crystal structure, comprising a second defect resonance cavity disposed in the transmissive region and having multiple second holes surrounding the second defect resonance cavity and the fourth holes in a periodic arrangement; and

a blue photonic crystal structure, comprising a third defect resonance cavity disposed in the transmissive region and having multiple third holes surrounding the third defect resonance cavity and the fourth holes in a periodic arrangement, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

17. The color filter according to claim 16, wherein the material of the color filter layer comprises dielectric material.

18. The color filter according to claim 16, further comprising a black matrix disposed on the substrate to define multiple pixel regions on the substrate.

19. The color filter according to claim 18, wherein the red photonic crystal structure, the green photonic crystal structure and the blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

20. The color filter according to claim 18, wherein the reflective region and the transmissive region are adjacently disposed in each of the pixel regions.

21. The color filter according to claim 18, wherein the reflective region and the transmissive region are alternately disposed in each of the pixel regions.

22. The color filter according to claim 16, wherein the material of the organic material layer is silicon nitride or silicon oxide.

23. The color filter according to claim 16, wherein the substrate comprises a transparent substrate.

24. A color filter, comprising:

a substrate, comprising a reflective region and a transmissive region;

an organic material layer, disposed on the substrate and in the reflective region; and

a color filter layer, disposed on the substrate and covering the organic material layer;

the color filter layer comprising;

a red photonic crystal structure, comprising multiple first defect resonance cavities disposed in the transmissive region and having multiple first holes surrounding the first defect resonance cavities and multiple fourth holes in a periodic arrangement, wherein the distance between two adjacent first defect resonance cavities is larger than or equal to three periodic intervals;

a green photonic crystal structure, comprising multiple second defect resonance cavities disposed in the transmissive region and having multiple second holes surrounding the second defect resonance cavities and the fourth holes in a periodic arrangement, wherein the distance between two adjacent second defect resonance cavities is larger than or equal to three periodic intervals; and

a blue photonic crystal structure, comprising multiple third defect resonance cavities disposed in the transmissive region and having multiple third holes surrounding the third defect resonance cavities and the fourth holes in a periodic arrangement, wherein the distance between two adjacent third defect resonance cavities is larger than or equal to three periodic intervals, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

25. The color filter according to claim 24, wherein the material of the color filter layer comprises dielectric material.

26. The color filter according to claim 24, further comprising a black matrix disposed on the substrate to define multiple pixel regions on the substrate.

27. The color filter according to claim 26, wherein the red photonic crystal structure, the green photonic crystal structure and the blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

28. The color filter according to claim 26, wherein the reflective region and the transmissive region are adjacently disposed in each of the pixel regions.

29. The color filter according to claim 26, wherein the reflective region and the transmissive region are alternately disposed in each of the pixel regions.

30. The color filter according to claim 24, wherein the material of the organic material layer is silicon nitride or silicon oxide.

31. The color filter according to claim 24, wherein the substrate comprises a transparent substrate.

32. A fabricating method of a color filter, comprising:

providing a substrate comprising a reflective region and a transmissive region;

forming an organic material layer on the substrate and in the reflective region;

forming a photonic crystal material layer on the substrate, wherein the photonic crystal material layer covers the organic material layer; and

patterning the photonic crystal material layer to form a color filter layer, wherein the color filter layer comprises;

a red photonic crystal structure, comprising a first defect resonance cavity disposed in the transmissive region and having multiple first holes surrounding the first defect resonance cavity and multiple fourth holes in a periodic arrangement;

a green photonic crystal structure, comprising a second defect resonance cavity disposed in the transmissive region and having multiple second holes surrounding the second defect resonance cavity and the fourth holes in a periodic arrangement; and

a blue photonic crystal structure, comprising a third defect resonance cavity disposed in the transmissive region and having multiple third holes surrounding the third defect resonance cavity and the fourth holes in a periodic arrangement, wherein

the hole diameter of the first holes is less than the hole diameter of the second holes and the hole diameter of the second holes is less than the hole diameter of the third holes.

33. The fabricating method of a color filter according to claim 32, wherein the material of the photonic crystal material layer comprises dielectric material.

34. The fabricating method of a color filter according to claim 32, further comprising forming a black matrix on the substrate to define multiple pixel regions on the substrate.

35. The fabricating method of a color filter according to claim 34, wherein the red photonic crystal structure, the green photonic crystal structure and the blue photonic crystal structure are respectively disposed in each of the corresponding pixel regions.

36. The fabricating method of a color filter according to claim 34, wherein the reflective region and the transmissive region are adjacently disposed in each of the pixel regions.

37. The fabricating method of a color filter according to claim 34, wherein the reflective region and the transmissive region are alternately disposed in each of the pixel regions.

38. The fabricating method of a color filter according to claim 32, wherein the material of the organic material layer is silicon nitride or silicon oxide.

39. The fabricating method of a color filter according to claim 32, wherein the substrate comprises a transparent substrate.