Exposure apparatus and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
- a projection optical system which projects the image of the pattern onto the substrate; and
a detection unit which detects a state of a surface of a part arranged in the vicinity of an image plane side of the projection optical system.
0 Assignments
0 Petitions
Accused Products
Abstract
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
138 Citations
33 Claims
-
1. An exposure apparatus which exposes a substrate by projecting an image of a pattern onto the substrate through a liquid, the exposure apparatus comprising:
-
a projection optical system which projects the image of the pattern onto the substrate; and
a detection unit which detects a state of a surface of a part arranged in the vicinity of an image plane side of the projection optical system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33)
-
Specification