Exposure apparatus and method for producing device
First Claim
1. An exposure apparatus which exposes a substrate by forming a liquid immersion area on a part of the substrate and projecting an image of a pattern onto the substrate through a liquid in the liquid immersion area, the exposure apparatus comprising:
- a projection optical system which projects the image of the pattern onto the substrate;
a substrate stage which is movable while holding the substrate;
a liquid supply mechanism which supplies the liquid onto the substrate to form the liquid immersion area;
a first liquid recovery mechanism which recovers the liquid from a surface of the substrate; and
a second liquid recovery mechanism which has a recovery port provided on the substrate stage and which recovers the liquid after completion of the exposure for the substrate.
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Abstract
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
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Citations
35 Claims
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1. An exposure apparatus which exposes a substrate by forming a liquid immersion area on a part of the substrate and projecting an image of a pattern onto the substrate through a liquid in the liquid immersion area, the exposure apparatus comprising:
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a projection optical system which projects the image of the pattern onto the substrate;
a substrate stage which is movable while holding the substrate;
a liquid supply mechanism which supplies the liquid onto the substrate to form the liquid immersion area;
a first liquid recovery mechanism which recovers the liquid from a surface of the substrate; and
a second liquid recovery mechanism which has a recovery port provided on the substrate stage and which recovers the liquid after completion of the exposure for the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification