Deformable Mirrors

• US 20080030824A1
• Filed: 06/22/2005
• Published: 02/07/2008
• Est. Priority Date: 06/22/2004
• Status: Active Grant

• Current Assignee: BAE Systems Plc
• Original Assignee: BAE Systems Plc
• Inventors: Griffith, Michael, Radcliffe, Sharon, McCarthy, Andrew, Laycock, Charles
• Granted Patent: US 7,567,374 B2
• Time in Patent Office: Days
• US Class Current: 359/224
• CPC Class Codes: G02B 26/06 for controlling the phase of light G02B26/08 takes precedence , measuring optical phase difference G01J9/00
• CPC Class Codes: G02B 26/0825 the reflecting element being a flexible sheet or membrane, e.g. for varying the focus flexible mirrors for cosmetic use A45D42/24

Abstract

The invention resides in the innovative use of deposition techniques in deformable mirrors. The use of deposition techniques allows contact pads for electrodes to be located wherever convenient. When applied to bimorph mirrors the invention enables both electro-restrictive layers to become active, increasing the stroke of the deformable mirror whilst retaining temperature insensitivity. A controllably-deformable mirror according to the invention comprises a deposition layer; a first electro-restrictive plate; a mirror surface; and a plurality of electrodes comprising a set of electrodes defined as regions on a first surface of the first electro-restrictive plate, the set of electrodes comprising a first electrode and a second electrode; and a common electrode on a second surface of the first electro-restrictive plate.

Claims

1. A controllably-deformable mirror comprising:

a first electro-restrictive plate;

a mirror surface;

a set of electrodes defined as regions on a first surface of the first electro-restrictive plate, the set of electrodes comprising a first electrode and a second electrode;

a common electrode on a second surface of the first electro-restrictive plate;

a set of contacts removed from the set of electrodes, the set of contacts including a first contact electrically connected to the first electrode and a second contact electrically connected to the second electrode;

a set of conducting tracks to electrically connect the set of electrodes to the set of contacts;

and a passivation layer interposed between the set of conducting tracks and the set of electrodes and adapted to mutually insulate the set of electrodes.

2. A controllably-deformable mirror as claimed in claim 1 wherein the set of contacts are positioned such that an external mirror-driver operable to apply voltages to the electrodes can be interchangeably electrically connected to the set of contacts.

3. A controllably-deformable mirror as claimed in claim 1, wherein the passivation layer and the set of conducting tracks are provided by a flexi-circuit.

4. A controllably-deformable mirror as claimed in claim 3 wherein the flexi-circuit comprises a first portion shaped to correspond with the shape of the first electro-restrictive plate and a second portion extending from the mirror to provide the set of contacts, the first portion being adapted to provide a passivation layer.

5. A controllably-deformable mirror as claimed in claim 1, further comprising a second electro-restrictive plate attached to the first electro-restrictive plate such that the passivation layer is interposed between the first and second electro-restrictive plates.

6. A controllably-deformable mirror as claimed in claim 1, wherein the passivation layer comprises a polyimide.

7. A controllably-deformable mirror as claimed in claim 1, wherein the passivation layer comprises a deposition layer.

8. a controllably-deformable mirror as claimed in claim 7 wherein the contacts are arranged in a peripheral region of the mirror at or near the circumference of the first electro-restrictive plate.

9. A controllably-deformable mirror as claimed in claim 7, wherein the mirror surface is on the first surface of the first electro-restrictive plate.

10. A controllably-deformable mirror as claimed in claim 9 wherein the passivation layer is interposed between the mirror surface and the first surface of the electro-restrictive plate.

11. A controllably-deformable mirror as claimed in claim 7, further comprising a second electro-restrictive plate, wherein the deposition layer is interposed between the first and second electro-restrictive plates.

12. A controllably-deformable mirror as claimed in claim 9, wherein the deposition layer comprises silicon dioxide.

13. A controllably-deformable mirror as claimed in claim 12 wherein the deposition layer is between 16 μ

m and 20 μ

m thick such that it is able to hold off a potential difference across it in the range 800V to 1000V.

14. A controllably-deformable mirror as claimed in claim 7, further comprising a flexi-circuit to electrically connect the contracts to the mirror driver.

15. A controllably-deformable mirror as claimed in claim 1, further comprising a planarisation layer.

16. A controllably-deformable mirror as claimed claim 15 wherein the planarisation layer comprises a deposition layer.

17. A controllably-deformable mirror as claimed in claim 15, herein the planarisation layer comprises any one of silicon dioxide and silicon nitride.

18. A controllably-deformable mirror as claimed in any claim 15, wherein the thickness of the planarisation layer is in the range 5 μ

m to 30 μ

m.

19. A controllably-deformable mirror according to claim 1, further comprising a plurality of strain gauges provided in association with a layer of the mirror to provide information relating to deformation of the mirror.

20. A controllably-deformable mirror according to claim 19, wherein each of said plurality of strain gauges are provided in regions of the mirror associated with electrodes.

21. A controllably-deformable mirror according to claim 19, wherein said plurality of strain gauges comprise strain gauges arranged as substantially mutually orthogonal pairs.

22. A controllably-deformable mirror according to claim 19, wherein at least one of said plurality of strain gauges is in the form of a double spiral.

23. A controllably-deformable mirror according to claim 19, wherein said plurality of strain gauges are deposited on or within a passivation layer of the mirror.

24. A controllably-deformable mirror according to claim 23, wherein said passivation layer is provided between an electro-restrictive layer and a planarisation layer of the mirror.

26. A controllably-deformable mirror as claimed in any preceding claim 1, mounted in a deformable-mirror holder.

27. A controllably-deformable mirror as claimed in claim 26 wherein the deformable-mirror holder comprises a support structure adapted to support the mirror from below.

25. (canceled)

28. (canceled)

29. A method of manufacturing a controllably-deformable mirror having an electro-restrictive plate, comprising the steps of:

defining a set of electrodes, comprising a first electrode and a second electrode, on a first surface of the electro-restrictive plate;

depositing a passivation layer adapted to mutually insulate the set of electrodes; and

applying a mirror surface.

30. A method as claimed in claim 29 further comprising the step of arranging a set of contact pads in a peripheral region of the mirror, the set of contact pads comprising a first contact pad electrically connected to the first electrode, and a second contact pad electrically connected to the second electrode.

31. a method as claimed in claim 29, wherein the step of depositing a passivation layer comprises depositing a passivation layer on the first surface of the electro-restrictive plate.

32. A method as claimed in claim 29, wherein the step of applying a mirror surface comprises applying a mirror surface to the first surface of the electro-restrictive plate.

33. A method as claimed in claim 32 wherein the passivation layer comprises silicon dioxide.

34. A method as claimed in claim 33 wherein the passivation layer is between 16 μ

m and 20 μ

m thick.

35. A method as claimed in claim 29, further comprising the step of depositing a planarisation layer.

36. A method as claimed in claim 35 wherein the planarisation layer comprises silicon nitride.

37. A method as claimed in claim 36 wherein the as-deposited planarisation layer is between 21 μ

m and 30 μ

m thick.

38. A method as claimed in claim 35, wherein the mirror surface is applied to the planarisation layer.

39. A method as claimed in claim 35, wherein the step of applying a mirror surface to the layer comprises the step of grinding and polishing the planarisation layer to optical flatness.

40. (canceled)