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Apparatus and method for a singulation of polymer waveguides using photolithography

  • US 20080031584A1
  • Filed: 08/02/2006
  • Published: 02/07/2008
  • Est. Priority Date: 08/02/2006
  • Status: Abandoned Application
First Claim
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1. A method, comprising;

  • forming a first polymer cladding layer on a first surface of a substrate;

    patterning the first polymer layer to form a plurality of bottom cladding elements on the first surface of the substrate, each of the bottom cladding elements structurally independent from the other bottom cladding elements patterned on the first surface of the substrate;

    forming and patterning a second polymer layer on each of the bottom cladding elements, the second polymer layer being patterned to form a plurality of waveguide cores on the plurality of bottom cladding elements respectively; and

    forming a third polymer top cladding layer over the plurality of waveguide cores of the patterned second polymer layer on each of the bottom cladding elements respectively, the bottom cladding elements, plurality of waveguide cores formed from the patterned second polymer layer, and the top cladding layer forming a plurality of polymer waveguides on the substrate.

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