INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE

• US 20080033559A1
• Filed: 06/29/2007
• Published: 02/07/2008
• Est. Priority Date: 10/29/2002
• Status: Active Grant

• Current Assignee: Medtronic Europe SARL (Medtronic Plc)
• Original Assignee: Kyphon SARL (Medtronic Plc)
• Inventors: Hsu, Ken, Yerby, Scott, Flynn, John, Mitchell, Steven, Zucherman, James, Markwart, John, Winslow, Charles
• Granted Patent: US 8,454,659 B2
• Time in Patent Office: Days
• US Class Current: 623/17.16
• CPC Class Codes: A61B 17/7047 Clamps comprising opposed elements which grasp one vertebra between them
• CPC Class Codes: A61B 17/7053 with parts attached to bones or to each other by flexible wires, straps, sutures or cables
• CPC Class Codes: A61B 17/7062 Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs rib fixation devices A61B17/8076; Tools for such devices
• CPC Class Codes: A61B 17/7065 Devices with changeable shape, e.g. collapsible or having retractable arms to aid implantation; Tools therefor
• CPC Class Codes: A61B 17/7068 Devices comprising separate rigid parts, assembled in situ, to bear on each side of spinous processes; Tools therefor
• CPC Class Codes: A61B 17/842 Flexible wires, bands or straps A61B17/72, A61B17/82, A61B17/86 take precedence

Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

Claims

1. An apparatus, comprising:

an implant having a central portion and a spiraled portion, at least a portion of the central portion of the implant configured to be disposed between a pair of adjacent spinous processes.

2. The apparatus of claim 1, wherein the spiraled portion is configured to move the central portion of the implant relative to the pair of adjacent spinous processes when at least a portion of the spiraled portion is rotated between the pair of adjacent spinous processes.

3. The apparatus of claim 1, wherein:

a portion of the spiraled portion is a first portion; and

a second portion of the spiraled portion of the implant is configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.

4. The apparatus of claim 1, wherein the implant has a proximal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.

5. The apparatus of claim 1, wherein the central portion of the implant is moved when the spiraled portion is rotated between the pair of adjacent spinous processes about an axis that is substantially lateral relative to the pair of adjacent spinous processes.

6. The apparatus of claim 1, wherein the spiraled portion has a distal portion and a proximal portion, the distal portion of the spiraled portion has an outer diameter greater than an outer diameter of the proximal portion of the spiraled portion.

7. The apparatus of claim 1, wherein the spiraled portion defines a thread having a constant outer diameter.

8. The apparatus of claim 1, wherein the implant is a first implant having a proximal end portion configured to movably mate with a second implant.

9. The apparatus of claim 1, wherein the implant has a distal portion configured to dilate a bodily tissue, the distal portion is distal relative to the spiraled portion.

10. The apparatus of claim 1, wherein the implant is a first implant configured to be coupled to a second implant having a proximal end portion configured to limit lateral movement of the first implant and the second implant relative to the pair of adjacent spinous processes when the portion of the central portion of the first implant is disposed between the pair of adjacent spinous processes.

11. The apparatus of claim 1, wherein the spiraled portion is a first spiraled portion, the implant has a second spiraled portion different from the first spiraled portion.

12. The apparatus of claim 1, wherein the implant is a first implant, the apparatus further comprising:

a second implant configured to be removably coupled to the first implant when the portion of the central portion is disposed between the pair of adjacent spinous processes such that a portion of the second implant is disposed between the portion of the central portion of the first implant and at least one spinous process from the pair of adjacent spinous processes.

13. The apparatus of claim 1, further comprising:

a spacer configured to define a space between the pair of adjacent spinous processes, the spacer configured to be lockably coupled to the implant.

14. An apparatus, comprising:

an implant having a central portion and a distal end portion, at least a portion of the central portion of the implant configured to be disposed between a pair of adjacent spinous processes,

the central portion of the implant configured to be moved distally when the distal end portion of the implant is disposed between the pair of adjacent spinous processes and is rotated about an axis that is substantially lateral relative to the pair of adjacent spinous processes.

15. The apparatus of claim 14, wherein the distal end portion of the implant is configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the portion of the central portion is disposed between the pair of adjacent spinous processes.

16. The apparatus of claim 14, wherein the implant is configured to be moved distally when the distal end portion is rotated in a first direction, the implant is configured to be moved proximally when the distal end portion is rotated in a second direction opposite the first direction.

17. The apparatus of claim 14, wherein the central portion of the implant is configured to be moved distally from a first position to a second position, the central portion of the implant is disposed outside of a space between the pair of adjacent spinous processes when in the first position, the portion of the central portion of the implant is disposed within the space between the pair of adjacent spinous processes when in the second position.

18. The apparatus of claim 14, wherein the implant is a first implant having a proximal end portion configured to movably mate with a second implant.

19. The apparatus of claim 14, wherein the distal end portion of the implant is configured to distract a bodily tissue between the pair of adjacent spinous processes.

20. The apparatus of claim 14, wherein the implant is a first implant configured to receive a second implant having a proximal end portion configured to limit lateral movement of the first implant and the second implant relative to the pair of adjacent spinous processes when the portion of the central portion of the first implant is disposed between the pair of adjacent spinous processes and the second implant is coupled to the first implant.

21. The apparatus of claim 14, wherein the central portion is configured to be moved via a spiraled portion of the distal end portion.

22. The apparatus of claim 14, wherein the axis is a longitudinal axis of the implant.

23. A method, comprising:

inserting into a body an implant having a distal retention portion configured to limit lateral movement of the implant relative to a pair of adjacent spinous processes when a central portion of the implant is disposed between the pair of adjacent spinous processes; and

rotating the distal retention portion about an axis to advance the distal retention portion through a space between the pair of adjacent spinous processes.

24. The method of claim 23, wherein the inserting includes distracting the space between the pair of adjacent spinous processes via a distal end portion of the implant.

25. The method of claim 23, wherein the axis is substantially lateral relative to the pair of adjacent spinous processes.

26. The method of claim 23, wherein the rotating includes contacting the distal retention portion with at least one spinous process from the pair of adjacent spinous processes.

27. The method of claim 23, wherein the distal retention portion is spiraled.

28. The method of claim 23, further comprising:

moving the distal retention portion through an opening in an interspinous ligament from a first side of the interspinous ligament,

the rotating includes rotating the distal retention portion such that at least the distal retention portion of the implant exits the interspinous ligament from a second side of the interspinous ligament.

29. The method of claim 23, wherein the implant has a proximal retention portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the central portion of the implant is disposed between the pair of adjacent spinous processes.

30. The method of claim 23, wherein the implant is a first implant, the method further comprising:

receiving within the first implant a second implant having a central portion configured to define a space between the pair of adjacent spinous processes.

31. The method of claim 23, wherein:

the implant is a first implant; and

a proximal end portion of the first implant defines a slot configured to receive a second implant.

32. The method of claim 23, wherein:

the implant is a first implant; and

a protrusion of the first implant is configured to be matingly received into an opening of a second implant.

33. The method of claim 23, wherein the inserting and the rotating are performed percutaneously via a lateral incision.

34. The method of claim 23, wherein the implant is a first implant, the method further comprising:

inserting into the body a second implant configured to be removably coupled to the first implant after the rotating.

35. The method of claim 23, wherein the implant is a first implant, the method further comprising:

inserting into the body a second implant having a distraction portion configured to distract the pair of adjacent spinous processes after the inserting the first implant, the second implant configured to be removably coupled to the first implant.

36. A method, comprising:

inserting into a body an implant having a central portion such that the central portion is disposed outside a space between a pair of adjacent spinous processes; and

rotating the implant about an axis substantially lateral to the pair of adjacent spinous processes such that the central portion of the implant is disposed within the space between the pair of adjacent spinous processes.

37. The method of claim 36, wherein the implant has a distal end portion, the rotating includes rotating the implant when at least a portion of the distal end portion is disposed between the pair of adjacent spinous processes.

38. The method of claim 36, wherein the implant has a distal end portion, the rotating includes contacting the distal end portion with at least one spinous process from the pair of adjacent spinous processes.

39. The method of claim 36, wherein:

the implant has a distal end portion having a spiraled portion; and

the rotating includes rotating the spiraled portion such that the central portion of the implant is moved into the space between the pair of adjacent spinous processes.

40. The method of claim 36, wherein the inserting includes distracting the space between the pair of adjacent spinous processes via a distal end portion of the implant.

41. The method of claim 36, wherein the implant is a first implant, the method further comprising:

receiving within the first implant a second implant having a central portion configured to define the space between the pair of adjacent spinous processes.

42. The method of claim 36, wherein the implant has a distal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the central portion of the implant is disposed within the space between the pair of adjacent spinous processes.

43. The method of claim 36, wherein the implant has a proximal end portion configured to limit lateral movement of the implant relative to the pair of adjacent spinous processes when the implant is disposed within the space between the pair of adjacent spinous processes.

44. The method of claim 36, wherein the inserting and the rotating are performed percutaneously via a lateral incision.

45. The method of claim 36, wherein the implant is a first implant, the method further comprising:

inserting into the body a second implant having a distraction portion configured to distract the pair of adjacent spinous processes after the inserting the first implant; and

removably coupling the second implant to the first implant.

46. The method of claim 36, wherein the axis is a longitudinal axis of the implant.