Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays

• US 20080035057A1
• Filed: 09/13/2007
• Published: 02/14/2008
• Est. Priority Date: 12/27/2004
• Status: Abandoned Application

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Roux, Steven
• Application Number:
  US11/854,958
• Publication Number:
  US 20080035057A1
• Time in Patent Office: Days
• US Class Current: 118/721
• CPC Class Codes: G02B 26/0833 the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD G02B26/0825 takes precedence; micromechanical devices in general B81B

Abstract

An apparatus for patterning an array of SLM mirrors with a phase step is disclosed. The apparatus includes a spatial light modulator (SLM) mirror, and a mask. The mask includes a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.

Claims

1. An apparatus for manufacturing a lithography system, comprising:

a spatial light modulator (SLM) mirror; and

a mask having a plurality of openings formed therein,

wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.

2. The apparatus of claim 1, wherein the openings have a width of approximately 3 micrometers and a length of approximately 20 micrometers.

3. The apparatus of claim 1, wherein the material comprises one of an ion beam and a reactive ion beam.

4. The apparatus of claim 3, wherein the reactive ion beam is substantially more reactive with a reflective coating of the SLM mirror than the mask.

5. The apparatus of claim 1, wherein the material comprises aluminum that is deposited on the SLM mirror.

6. The apparatus of claim 1, wherein the SLM mirror is one of a plurality of SLM mirrors included in an array of SLM mirrors, and the apparatus further comprises:

a stepper that moves the array of SLM mirrors in discrete steps along a first direction,

wherein, at each discrete step, the material is passed through the first opening in the mask to cause the material to impinge upon a predetermined area of another SLM mirror in the array of SLM mirrors that is aligned with the first opening, whereby a phase step is formed on the other SLM mirror aligned with the first opening.