Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays
First Claim
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1. An apparatus for manufacturing a lithography system, comprising:
- a spatial light modulator (SLM) mirror; and
a mask having a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.
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Abstract
An apparatus for patterning an array of SLM mirrors with a phase step is disclosed. The apparatus includes a spatial light modulator (SLM) mirror, and a mask. The mask includes a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.
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Citations
6 Claims
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1. An apparatus for manufacturing a lithography system, comprising:
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a spatial light modulator (SLM) mirror; and
a mask having a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification