METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM
First Claim
1. An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle, the apparatus comprising:
- an extended optical source adapted to provide an optical beam propagating along an optical path, wherein the optical beam is characterized by a path width measured in a first direction aligned with a dispense direction;
an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam;
a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector; and
a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
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Accused Products
Abstract
An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
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Citations
20 Claims
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1. An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle, the apparatus comprising:
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an extended optical source adapted to provide an optical beam propagating along an optical path, wherein the optical beam is characterized by a path width measured in a first direction aligned with a dispense direction; an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam; a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector; and a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of providing a predetermined fluid level of a dispense fluid in a dispense nozzle of a semiconductor process module, the method comprising:
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a) providing an optical beam propagating along an optical path, wherein the optical beam is provided by an optical source; b) positioning the dispense nozzle along the optical path at a first location between the optical source and an optical detector coupled to the optical path, the first location being characterized by a first position measured along a first direction aligned with a dispense direction such that the optical beam impinges on the dispense nozzle; c) establishing a first fluid level recessed a first distance from a tip of the dispense nozzle; d) measuring a first optical signal utilizing the optical detector; e) establishing a second fluid level recessed a second distance from the tip of the dispense nozzle, wherein the second distance is greater than the first distance; f) measuring a second optical signal utilizing the optical detector; and g) repeating steps (e) and (f) until a meniscus of the dispense fluid is associated with the predetermined fluid level. - View Dependent Claims (11, 12, 13)
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14. A system for controlling a semiconductor process fluid dispense operation, the system comprising:
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an extended optical source adapted to provide an optical beam propagating along an optical path, wherein the optical beam is characterized by a path width measured in a first direction aligned with a dispense direction; an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and to provide an optical signal; a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector, wherein the dispense nozzle is adapted to support the semiconductor process fluid; a suck back valve coupled to the dispense nozzle and adapted to modify a position of a semiconductor process fluid interface in the dispense nozzle; and a processor coupled to the optical detector and the suck back valve, wherein the processor is adapted to adjust the position of the semiconductor process fluid interface in response to the optical signal provided by the optical detector. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification