Stage apparatus and exposure apparatus
First Claim
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1. A stage apparatus comprising:
- a moving portion on which an object is placed;
a guide portion that guides the moving portion; and
a predetermined member that is provided on at least one of the moving portion and the guide portion and formed from a material having a non-uniform density distribution.
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Abstract
A wafer stage system moves a wafer stage that retains a wafer via a wafer holder along a wafer base. For example, the wafer holder is formed from a material whose density is not uniform, such that the portion that includes the reflecting surface that reflects a measuring beam for position measurement is a high-density portion, and the other portions are low-density portions. Or, the wafer stage is formed from a material whose density is not uniform, such that the portion that includes the surface that constitutes a gas bearing is a high-density portion, and the other portions are low-density portions.
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Citations
13 Claims
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1. A stage apparatus comprising:
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a moving portion on which an object is placed;
a guide portion that guides the moving portion; and
a predetermined member that is provided on at least one of the moving portion and the guide portion and formed from a material having a non-uniform density distribution. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. An exposure apparatus comprising:
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an illuminating optical system that irradiates a pattern by exposure light;
a projection optical system in which a substrate is exposed with an image of the pattern via the illuminating optical system; and
a mirror that is provided in the illuminating optical system or the projection optical system, with the density of the portion on which a reflecting surface is formed being higher than the density of the other portion.
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Specification