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Exposure Method, Exposure Apparatus, Exposure System and Device Manufacturing Method

  • US 20080038675A1
  • Filed: 02/18/2005
  • Published: 02/14/2008
  • Est. Priority Date: 02/20/2004
  • Status: Abandoned Application
First Claim
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1. An exposure method in which a plurality of times of exposure is performed on a same photosensitive object whereinthe substantial wavelength of an exposure light in a space between a projection optical system, which projects said exposure light on said photosensitive object, and said photosensitive object is different in at least one exposure in said plurality of times of exposure from another exposure.

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