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Substrate Cleaning Method and Computer Readable Storage Medium

  • US 20080041420A1
  • Filed: 06/01/2005
  • Published: 02/21/2008
  • Est. Priority Date: 06/04/2004
  • Status: Active Grant
First Claim
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1. A substrate cleaning method comprising:

  • supplying a two-fluid cleaning liquid onto a substrate, while rotating the substrate in an essentially horizontal state, thereby processing the substrate; and

    then rotating the substrate at a higher speed than that used in supplying the two-fluid cleaning liquid, thereby drying the substrate, after stopping supply of the two-fluid cleaning liquid, wherein the method comprises no rinsing process using purified water in a period after stopping supply of the two-fluid cleaning liquid and before rotating the substrate at the higher speed.

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