STRUCTURE OF A MICRO ELECTRO MECHANICAL SYSTEM AND THE MANUFACTURING METHOD THEREOF
First Claim
1. A method of manufacturing an optical interference display cell, comprising:
- forming a first electrode on a substrate;
forming a sacrificial layer on the first electrode;
forming a first material layer on the sacrificial layer;
forming a conductor layer comprising a light reflective surface on the first material layer, wherein the conductor layer is susceptible to etching by an etchant;
defining the conductor layer and the first material layer to form a second electrode; and
removing the sacrificial layer using the etchant, wherein the first material layer protects the light reflective surface from the etchant, wherein the optical interference display cell formed after removal of the sacrificial layer is configured to interferometrically reflect light entering the cavity and contacting the light reflective surface.
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Accused Products
Abstract
A structure of a micro electro mechanical system and a manufacturing method are provided, the structure and manufacturing method is adapted for an optical interference display cell. The structure of the optical interference display cell includes a first electrode, a second electrode and posts. The second electrode comprises a conductive layer covered by a material layer and is arranged about parallel with the first electrode. The support is located between the first plate and the second plate and a cavity is formed. In the release etch process of manufacturing the structure, the material layer protects the conductive layer from the damage by an etching reagent. The material layer also protects the conductive layer from the damage from the oxygen and moisture in the air.
125 Citations
25 Claims
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1. A method of manufacturing an optical interference display cell, comprising:
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forming a first electrode on a substrate;
forming a sacrificial layer on the first electrode;
forming a first material layer on the sacrificial layer;
forming a conductor layer comprising a light reflective surface on the first material layer, wherein the conductor layer is susceptible to etching by an etchant;
defining the conductor layer and the first material layer to form a second electrode; and
removing the sacrificial layer using the etchant, wherein the first material layer protects the light reflective surface from the etchant, wherein the optical interference display cell formed after removal of the sacrificial layer is configured to interferometrically reflect light entering the cavity and contacting the light reflective surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of manufacturing an optical interference display cell, comprising:
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forming a first electrode on a substrate;
forming a sacrificial layer on the first electrode;
forming a first material layer on the sacrificial layer;
forming a conductor layer comprising a light reflective surface on the first material layer, wherein the conductor layer is susceptible to etching by an etchant;
forming a second material layer on the conductor layer;
defining the second material layer, the conductor layer and the first material layer to form a second electrode; and
removing the sacrificial layer using the etchant, wherein the first material layer protects the light reflective surface from the etchant, wherein the optical interference display cell formed after removal of the sacrificial layer is configured to interferometrically reflect light entering the cavity and contacting the light reflective surface. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25)
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Specification