BIMORPHIC STRUCTURES, SENSOR STRUCTURES FORMED THEREWITH, AND METHODS THEREFOR
First Claim
1. A sensor structure comprising:
- a substrate;
a first contact on the substrate and formed of an electrically conductive material; and
a bimorph beam anchored to the substrate and having a portion thereof suspended above the first contact, the bimorph beam having a multilayer structure comprising first and second layers, the second layer being between the first layer and the substrate, the first layer having a portion that projects through an opening in the second layer toward the first contact, the first layer being formed of an electrically conductive material and the portion of the first layer projecting through the opening defining a second contact, the second contact being located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.
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0 Petitions
Accused Products
Abstract
A bimorphic structure responsive to changes in an environmental condition, sensor structures incorporating one or more of such bimorphic structures, and a method of forming such bimorphic structures. The sensor structure has an electrically-conductive first contact on a substrate, and a bimorph beam anchored to the substrate so that a portion thereof is suspended above the first contact. The bimorph beam has a multilayer structure that includes first and second layers, with the second layer between the first layer and the substrate. A portion of the first layer projects through an opening in the second layer toward the first contact so as to define an electrically-conductive second contact located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate.
14 Citations
20 Claims
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1. A sensor structure comprising:
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a substrate;
a first contact on the substrate and formed of an electrically conductive material; and
a bimorph beam anchored to the substrate and having a portion thereof suspended above the first contact, the bimorph beam having a multilayer structure comprising first and second layers, the second layer being between the first layer and the substrate, the first layer having a portion that projects through an opening in the second layer toward the first contact, the first layer being formed of an electrically conductive material and the portion of the first layer projecting through the opening defining a second contact, the second contact being located on the beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the beam sufficiently deflects toward the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of forming a sensor structure, the method comprising:
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depositing an electrically conductive material and forming therefrom a first contact on a substrate; and
forming a bimorph beam anchored to the substrate so as to have a portion thereof suspended above the first contact, the bimorph beam being formed to have a multilayer structure comprising first and second layers, the second layer being between the first layer and the substrate, the first layer being formed to have a portion that projects through an opening in the second layer toward the first contact, the first layer being formed of an electrically conductive material and the portion of the first layer projecting through the opening defining a second contact, the second contact being located on the bimorph beam so as to be spaced apart and aligned with the first contact for contact with the first contact when the bimorph beam sufficiently deflects toward the substrate. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20)
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Specification