Lithographic apparatus and device manufacturing method
First Claim
1. A positioning device configured to position a first movable object and a second movable object in a substantially common operation area, the positioning device comprising:
- a first coil assembly arranged at one side of the operation area;
a second coil assembly arranged at an opposite side of the operation area;
a first magnet arranged on the first movable object and configured to cooperate with the first coil assembly; and
a second magnet arranged on the second movable object and configured to cooperate with the second coil assembly.
1 Assignment
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Accused Products
Abstract
A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.
15 Citations
20 Claims
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1. A positioning device configured to position a first movable object and a second movable object in a substantially common operation area, the positioning device comprising:
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a first coil assembly arranged at one side of the operation area; a second coil assembly arranged at an opposite side of the operation area; a first magnet arranged on the first movable object and configured to cooperate with the first coil assembly; and a second magnet arranged on the second movable object and configured to cooperate with the second coil assembly. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A lithographic apparatus comprising:
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a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a first substrate stage and a second substrate stage each constructed to hold a substrate and being movable in a common operation area; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a positioning device configured to position the first substrate stage and the second substrate stage in the common operation area, the positioning device comprising a first coil assembly arranged at one side of the operation area, a second coil assembly arranged at an opposite side of the operation area, a first magnet arranged on the first substrate stage and configured to cooperate with the first coil assembly, and a second magnet arranged on the second substrate stage and configured to cooperate with the second coil assembly. - View Dependent Claims (9, 10, 11)
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12. A positioning device configured to position a first movable object and a second movable object in a substantially common operation area, the positioning device comprising:
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a first magnet arranged on the first movable object; a second magnet arranged on the second movable object; and three or more coil plates each comprising a coil assembly, the three or more coil plates being arranged adjacent to each other, and extending substantially in a same plane at one side of the substantially common operation area, wherein each of the three or more coil plates is configured to cooperate with the first magnet or the second magnet to actuate the first or second movable object, respectively. - View Dependent Claims (13, 14, 15, 16, 17)
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18. A lithographic apparatus comprising:
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a patterning device support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; a first substrate stage and a second substrate stage each constructed to hold a substrate and being movable in a common operation area; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a positioning device configured to position the first substrate stage and the second substrate stage in a substantially common operation area, the positioning device comprising a first magnet arranged on the first substrate stage, a second magnet arranged on the second substrate stage, and three or more coil plates each comprising a coil assembly, the three or more coil plates being arranged adjacent to each other, and extending substantially in a same plane at one side of the substantially common operation area, each of the three or more coil plates configured to cooperate with the first magnet or the second magnet to actuate the first or second substrate stage, respectively.
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19. A device manufacturing method comprising:
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projecting a patterned beam of radiation onto a substrate; and positioning a first substrate stage and a second substrate stage in a common operation area with a positioning device, each of the first and second substrate stages configured to support the substrate, the positioning device comprising a first coil assembly arranged at one side of the operation area, a second coil assembly arranged at an opposite side of the operation area, a first magnet arranged on the first substrate stage and configured to cooperate with the first coil assembly, and a second magnet arranged on the second substrate stage and configured to cooperate with the second coil assembly.
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20. A positioning device configured to position a first substrate table and a second substrate table of a lithographic apparatus in a substantially common operation area, the positioning device comprising:
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a first and a second coil assembly extending substantially over the common operation area, the first and the second substrate tables arranged between the first and the second coil assemblies; a first magnet assembly arranged on the first substrate table and configured to cooperate with the first coil assembly to move the first substrate table in the common operation area; and a second magnet assembly arranged on the second substrate table and configured to cooperate with the second coil assembly to move the second substrate table in the common operation area.
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Specification