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Exposure method and apparatus, and method for fabricating device

  • US 20080068572A1
  • Filed: 09/20/2007
  • Published: 03/20/2008
  • Est. Priority Date: 04/09/2003
  • Status: Active Grant
First Claim
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1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, wherein the pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas, the pair of the first areas being arranged outside an optical axis on a pupil plane of the illumination system, the pair of the second areas being arranged on the same straight line as the pair of the first areas are arranged on and the pair of the second areas being arranged outside the pair of the first areas.

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