METAL OXIDE FILMS
First Claim
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1. A deposition method for depositing a film, comprising:
- providing a substrate in a reaction space; and
forming a metal oxide film on the substrate by repeatedly exposing the substrate to sequential and temporally separated pulses of an oxygen-containing material and a metal-containing material comprising a cyclopentadienyl group, wherein the pulses of the metal-containing material forms a layer of the metal on the substrate by a self-controlled surface reaction.
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Abstract
Atomic layer deposition (ALD) type processes for producing titanium containing oxide thin films comprise feeding into a reaction space vapour phase pulses of titanium alkoxide as a titanium source material and at least one oxygen source material, such as ozone, capable of forming an oxide with the titanium source material. In preferred embodiments the titanium alkoxide is titanium methoxide.
89 Citations
22 Claims
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1. A deposition method for depositing a film, comprising:
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providing a substrate in a reaction space; and
forming a metal oxide film on the substrate by repeatedly exposing the substrate to sequential and temporally separated pulses of an oxygen-containing material and a metal-containing material comprising a cyclopentadienyl group, wherein the pulses of the metal-containing material forms a layer of the metal on the substrate by a self-controlled surface reaction. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 18)
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12. An atomic layer deposition method for forming a film on a substrate, comprising;
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exposing the substrate to a metal precursor to self-limitingly deposit a metal-containing layer on the substrate, the metal precursor comprising a cyclopentadienyl group; and
exposing the metal-containing layer to an oxygen-containing material to form a metal oxide film. - View Dependent Claims (13, 14, 15, 16, 17)
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19. An atomic layer deposition method, comprising:
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depositing a layer of material on a substrate by a self-controlled surface reaction with a surface of the substrate by exposing the substrate to a metal precursor comprising a cyclopentadienyl group; and
exposing the layer of material to an oxygen-containing material reactive with the deposited monolayer. - View Dependent Claims (20, 21)
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22. A method for growing amorphous oxide thin films on a substrate in a reactor, comprising:
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producing the films by the Atomic Layer Epitaxy (ALE) process at a temperature of 150 to 400°
C. by feeding pulses of precursor compounds into the reactor alternately to achieve film growth through saturating surface reactions and by purging the reactor with an inert gas between the precursor pulses to provide alternate self-limiting surface reactions on the substrate, wherein the precursor compounds comprise;
at least one cyclopentadienyl compound containing an earth-alkali metal; and
a reactive oxygen precursor.
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Specification