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Method For Processing Outer Periphery Of Substrate And Apparatus Thereof

  • US 20080073324A1
  • Filed: 07/08/2005
  • Published: 03/27/2008
  • Est. Priority Date: 07/09/2004
  • Status: Abandoned Application
First Claim
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1. A method for processing the outer peripheral part of a substrate in which an unnecessary matter coated on the outer peripheral part of said substrate is removed by contacting said unnecessary matter with a reactive gas, said method comprising:

  • supporting said substrate by a stage so as to be brought a proximal outer peripheral part of said substrate into contact with a support surface of said stage in a manner protruding the outer peripheral part of said substrate from said stage locally radiantly heating the protruded outer peripheral part of said substrate with a thermal light;

    supplying said reactive gas to the heated outer peripheral part of said substrate; and

    heat absorbing the proximal outer peripheral part of said substrate by a heat absorber disposed on said stage.

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