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THIN FILMS AND METHODS OF MAKING THEM

  • US 20080073645A1
  • Filed: 09/12/2007
  • Published: 03/27/2008
  • Est. Priority Date: 02/12/2001
  • Status: Active Grant
First Claim
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1. An integrated circuit comprising a continuous amorphous Si-containing film having a thickness that is 15 Å

  • or greater and that is 150 Å

    or less, a surface area of about one square micron or greater, and a thickness non-uniformity of about 10% or less for a mean film thickness in the range of 100 Å

    to 150 Å

    , a thickness non-uniformity of about 15% or less for a mean film thickness in the range of 50 Å

    to 99 Å

    , and a thickness non-uniformity of about 20% or less for a mean film thickness of less than 50 Å

    .

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