Pattern generator
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Abstract
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
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Citations
49 Claims
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1-19. -19. (canceled)
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20. A method for creating a microlithographic pattern on a workpiece sensitive to radiation using a spatial light modulator (SLM) having a plurality of modulating elements with adjoining stationary areas, the modulating elements, the method comprising:
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reading, from an information storage device, a pattern description describing geometry of a binary pattern for features of a semiconductor device with an address grid unit in a range of 1 nm to 100 nm;
extracting a sequence of partial patterns from the pattern description;
converting said partial patterns to modulator signals;
operating at least some of the modulating elements so that the piston elements are driven to phases relative to the adjoining stationary areas to produce a desired intensity;
emitting electromagnetic radiation in the wavelength range from extreme ultraviolet (EUV) to infrared (IR);
illuminating the SLM using said radiation;
projecting the illumination from the SLM onto the workpiece forming a partial image; and
moving at least one of said workpiece and projection system relative to each other while coordinating the movement, the operation of modulating elements and intensity of the radiation such that said pattern is stitched together from the partial images created by the sequence of partial patterns. - View Dependent Claims (21, 22, 23, 24)
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25. A method of optical printing using an SLM in a system including an optical system for projecting an image of the SLM onto a workpiece that is positioned on a moving stage, the method comprising:
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selectively illuminating portions of the SLM, a first part of the SLM being loaded with data while a second part of the SLM is illuminated; and
printing a pattern on the workpiece with radiation modulated using the SLM. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33)
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34. An apparatus for creating a pattern on a workpiece sensitive to light radiation, the apparatus comprising
a source for emitting electromagnetic radiation in a wavelength range from EUV to IR; -
a spatial light modulator (SLM) having a plurality of modulating elements operable for being illuminated by said radiation;
a projection system for creating an image of the modulator on the workpiece;
an electronic data processing and delivery system for receiving a digital description of the pattern, converting said pattern to modulator signals, and sending said signals to the modulator;
a precision mechanical system for positioning at least one of said workpiece and said projection system relative to each other;
an electronic control system controlling the position of the workpiece, the sending of the signals to the modulator and the intensity of the radiation, such that said pattern is printed on the workpiece;
whereinthe input pattern description is converted to modulator voltages for particular pixels to correct for variation among pixels using a lookup memory. - View Dependent Claims (35, 36, 37)
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38. A method for creating a pattern on a workpiece sensitive to light radiation, the method comprising
emitting electromagnetic radiation on a spatial light modulator (SLM) having a plurality of modulating elements, the electromagnetic radiation being in a wavelength range from EUV to IR; -
creating an image of the SLM on the workpiece using a projection system;
converting a received digital description of the pattern into modulator signals, the received digital description of the pattern being converted to modulator voltages for particular pixels to correct for variation among pixels using a lookup memory;
sending said signals to the modulator;
positioning at least one of said workpiece and said projection system relative to each other; and
controlling the position of the workpiece, the sending of the signals to the modulator and the intensity of the radiation, such that said pattern is printed on the workpiece. - View Dependent Claims (39, 40, 41)
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42. A method for printing a pattern on a workpiece, the method comprising:
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first exposing, during a first pass, the workpiece to a first intensity of electromagnetic radiation to create a first portion of the pattern on the workpiece;
measuring, during the first exposure, the actual intensity of the electromagnetic radiation used during first pass; and
second exposing, during a second pass, the workpiece to a second intensity of the electromagnetic radiation for actual printing of the pattern based on the measured actual intensity. - View Dependent Claims (43, 44, 45, 46, 47, 48, 49)
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Specification