Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method, and device manufacturing method

• US 20080088843A1
• Filed: 02/21/2007
• Published: 04/17/2008
• Est. Priority Date: 02/21/2006
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Granted Patent: US 8,054,472 B2
• Time in Patent Office: Days
• US Class Current: 356/399
• CPC Class Codes: G03F 2009/005 for microlithography
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70641 Focus
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 9/7003 Alignment type or strategy, e.g. leveling, global alignment
• CPC Class Codes: G03F 9/7026 Focusing
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

While a wafer stage linearly moves in a Y-axis direction, a multipoint AF system detects surface position information of the wafer surface at a plurality of detection points that are set at a predetermined distance in an X-axis direction and also a plurality of alignment systems that are arrayed in a line along the X-axis direction detect each of marks at positions different from one another on the wafer. That is, detection of surface position information of the wafer surface at a plurality of detection points and detection of the marks at positions different from one another on the wafer are finished, only by the wafer stage (wafer) linearly passing through the array of the plurality of detection points of the multipoint AF system and the plurality of alignment systems, and therefore, the throughput can be improved, compared with the case where a detection operation of the marks and a detection operation of the surface position information (focus information) are independently performed.

Claims

1. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another;

a plurality of mark detecting systems whose detection areas are placed apart in a direction parallel to the second axis, and that each detect the different marks on the object; and

a surface position detecting unit that detects surface position information of the object at a plurality of detection points whose positions are different in a direction parallel to the second axis, by irradiating a detection beam to the object and receiving a reflected light of the detection beam.

2. The pattern forming apparatus of claim 1, wherein

the detection areas of the plurality of mark detecting systems can be set along a direction parallel to the second axis.

3. The pattern forming apparatus of claim 1, wherein

relative positions of the detection areas of the plurality of mark detecting systems are variable in at least a direction parallel to the second axis.

4. The pattern forming apparatus of claim 1, wherein

the plurality of mark detecting systems include a first mark detecting system that has the fixed detection area, and a second mark detecting system that has the detection area whose position can be adjusted in at least a direction parallel to the second axis.

5. The pattern forming apparatus of claim 4, wherein

the plurality of mark detecting systems include at least a pair of the second mark detecting systems whose detection centers can be symmetrically set with respect to a detection center of the first mark detecting system.

135. The pattern forming apparatus of claim 4, further comprising:

a position adjusting unit that adjusts a position of the second mark detecting system based on placement of a plurality of marks on the object.

136. The pattern forming apparatus of claim 4, further comprising:

an arm member that has a turning end portion to which the second mark detecting system is attached, and turns around an axis that is parallel to a third axis orthogonal to the first axis and the second axis.

137. The pattern forming apparatus of claim 4, further comprising:

a holding unit that fixes the second mark detecting system maintaining a state where the position of the second mark detecting system is adjusted, after the position adjustment is performed before the detection operation of the marks is started.

138. The pattern forming apparatus of claim 4, further comprising:

a measurement controller that performs a measurement operation of a relative position of the second mark detecting system with respect to the first mark detecting system during a period from when exposure to the object on the movable body is completed until when the object is carried out of the movable body and another object is carried in.

139. The pattern forming apparatus of claim 1, wherein placement of the plurality of detection points of the surface position detecting unit is set in accordance with placement of the plurality of mark detecting systems.

140. The pattern forming apparatus of claim 1, wherein positions of the detection areas of the plurality of mark detecting systems are different from positions of the plurality of detection points of the surface position detecting unit in a direction parallel to the first axis.

141. The pattern forming apparatus of claim 140, wherein the plurality of detection points of the surface position detecting unit are placed between a position where pattern formation to the object is performed and the detection areas of the plurality of mark detecting systems in a direction parallel to the first axis.

142. The pattern forming apparatus of claim 140, further comprising:

a controller that moves the movable body in a direction parallel to the first axis at the time of detection operations of the plurality of mark detecting systems and the surface position detecting unit, and also executes at least a part of the detection operations in parallel.

143. The pattern forming apparatus of claim 1, further comprising:

a controller that detects marks in a plurality of groups whose positions are different in a direction parallel to the first axis on the object with the plurality of mark detecting systems per each of the groups, by moving the movable body in a direction parallel to the first axis, wherein

at least marks in one group out of the marks in the plurality of groups include a plurality of marks whose positions are different in a direction parallel to the second axis.

144. The pattern forming apparatus of claim 1, further comprising:

a controller that almost simultaneously detects a plurality of marks on the object using the plurality of mark detecting systems every time when moving the movable body in a direction parallel to the first axis, and also detects surface position information of the object that has passed through the detection areas of the plurality of mark detecting systems according to movement of the movable body in a direction parallel to the first axis using the surface position detecting unit.

145. The pattern forming apparatus of claim 1, wherein simultaneous detection of the marks by the plurality of mark detecting systems is performed a plurality of times while changing a focus state with respect to the plurality of marks on the object.

146. The pattern forming apparatus of claim 1, wherein the pattern is formed on the object by exposing the object with an energy beam.

6-134. -134. (canceled)

147. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object, and also has a surface on which a first grating having a grating whose periodic direction is a direction parallel to the first axis is arranged in pairs;

a plurality of mark detecting systems that have detection areas whose positions are different in a direction parallel to the second axis; and

a first axis encoder that has a plurality of first heads including a pair of first heads each one of which is placed on both outer sides of the plurality of detection areas in a direction parallel to the second axis, and measures position information of the movable body in a direction parallel to the first axis by the first head that faces at least one of the pair of first gratings.

148. The pattern forming apparatus of claim 147, wherein

on the surface of the movable body, a second grating having a grating whose periodic direction is a direction parallel to the second axis is further arranged, and

the pattern forming apparatus further comprises

a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis, and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating.

149. The pattern forming apparatus of claim 148, wherein the plurality of mark detecting systems include a first mark detecting system that has the fixed detection area, and at least a pair of second mark detecting systems having the detection areas that are each placed on both sides of the detection area of the first mark detecting system in a direction parallel to the second axis and whose positions can be adjusted in a direction parallel to the second axis.

150. The pattern forming apparatus of claim 149, wherein a part of the plurality of second heads is attached to the first mark detecting system.

151. The pattern forming apparatus of claim 149, further comprising:

a position adjusting unit that adjusts a position of the second mark detecting system based on placement of a plurality of marks on the object.

152. The pattern forming apparatus of claim 149, further comprising:

an arm member that has a turning end portion to which the second mark detecting system is attached, and turns around an axis that is parallel to a third axis orthogonal to the first axis and the second axis.

153. The pattern forming apparatus of claim 149, further comprising:

a holding unit that fixes the second mark detecting system maintaining a state where the position of the second mark detecting system is adjusted, after the position adjustment is performed before the detection operation of the marks is started.

154. The pattern forming apparatus of claim 149, further comprising:

a measurement controller that performs a measurement operation of a relative position of the second mark detecting system with respect to the first mark detecting system during a period from when exposure to the object on the movable body is completed until when the object is carried out of the movable body and another object is carried in.

155. The pattern forming apparatus of claim 149, further comprising:

another movable body that moves independently from the movable body within the plane; and

a reference member that is mounted on the another movable body, and on which a pair of reference gratings that are placed apart in a direction parallel to the second axis and whose periodic direction is a direction parallel to the first axis, and a plurality of reference marks in an area between the pair of reference gratings that can be simultaneously detected by the plurality of mark detecting systems are formed.

156. The pattern forming apparatus of claim 155, wherein the reference member is kinematically supported on the another movable body.

157. The pattern forming apparatus of claim 155, wherein relative position measurement of the second mark detecting system with respect to the first mark detecting system is performed by simultaneously detecting the plurality of reference marks with the first and second mark detecting systems.

158. The pattern forming apparatus of claim 155, wherein

a state of the movable body and the another movable body can be switched to a first state where both the movable bodies are closer together at a predetermined distance or less and a second state where both the movable bodies are separate, and

the pattern forming apparatus further comprises

an optical system that projects an image of the pattern;

and

a controller that starts measurement of a positional relation between a projection position of an image of the pattern by the optical system and a detection center of the first mark detecting system in the first state and ends the measurement in the seconds state.

159. The pattern forming apparatus of claim 148, wherein on the movable body, the first grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the second axis and also the second grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the first axis, and

the pattern forming apparatus further comprises

a measuring unit that measures position information of the movable body in directions parallel to the first and second axes and rotation information within the plane, based on measurement values of two first axis encoders that have a plurality of first heads at least each one of which faces the pair of first gratings and whose positions are different in a direction parallel to the second axis, and of two second axis encoders that have a plurality of second heads at least each one of which faces the pair of second gratings and whose positions are different in a direction parallel to the first axis.

160. The pattern forming apparatus of claim 147, wherein

the plurality of first heads include the first heads in first and second groups whose positions are different from positions of the pair of first heads in a direction parallel to the first axis, and also whose positions are each different in a direction parallel to the second axis, and

at least one of the first heads in the first group faces one of the pair of first gratings, and at least one of the first heads in the second group faces the other of the pair of first gratings.

161. The pattern forming apparatus of claim 160, wherein

on the movable body, the first grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the second axis and also the second grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the first axis, and

the pattern forming apparatus further comprises

a measuring unit that measures position information of the movable body in directions parallel to the first and second axes and rotation information within the plane, based on measurement values of two first axis encoders that have a plurality of first heads at least each one of which faces the pair of first gratings and whose positions are different in a direction parallel to the second axis, and of two second axis encoders that have a plurality of second heads at least each one of which faces the pair of second gratings and whose positions are different in a direction parallel to the first axis.

162. The pattern forming apparatus of claim 147, wherein

simultaneous detection of the marks by the plurality of mark detecting systems is performed a plurality of times while changing a focus state with respect to the plurality of marks on the object.

163. The pattern forming apparatus of claim 147, wherein the pattern is formed on the object by exposing the object with an energy beam.

164. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object, and also has a surface on which a first grating having a grating whose periodic direction is a direction parallel to the first axis and a second grating having a grating whose periodic direction is a direction parallel to the second axis are arranged;

at least one mark detecting system that detects marks on the object;

a measuring unit that has a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating, and a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating; and

a controller that detects the marks on the object using the mark detecting system while controlling a position of the movable body based on measurement values by the measuring unit.

165. The pattern forming apparatus of claim 164, further comprising:

an optical system that projects an image of the pattern, wherein

the controller controls a position of the movable body based on the measurement values by the measuring unit when measuring a positional relation between a projection position of an image of the pattern by the optical system and a detection center of the mark detecting system using a fiducial mark on the movable body.

166. The pattern forming apparatus of claim 165, wherein

the controller performs a detection operation of the marks on the object before completing a measurement operation of the positional relation.

167. The pattern forming apparatus of claim 165, wherein the controller performs a measurement operation of the positional relation before completing a detection operation of a plurality of marks to be detected on the object.

168. The pattern forming apparatus of claim 164, wherein

the mark detecting system includes a fixed first mark detecting system and a plurality of second mark detecting systems whose positions can be adjusted relative to the first mark detecting system.

169. The pattern forming apparatus of claim 168, further comprising:

a position adjusting unit that adjusts a position of the second mark detecting system based on placement of a plurality of marks on the object.

170. The pattern forming apparatus of claim 168, further comprising:

an arm member that has a turning end portion to which the second mark detecting system is attached, and turns around an axis that is parallel to a third axis orthogonal to the first axis and the second axis.

171. The pattern forming apparatus of claim 168, further comprising:

a holding unit that fixes the second mark detecting system maintaining a state where the position of the second mark detecting system is adjusted, after the position adjustment is performed before the detection operation of the marks is started.

172. The pattern forming apparatus of claim 168, further comprising:

a measurement controller that performs a measurement operation of a relative position of the second mark detecting system with respect to the first mark detecting system during a period from when exposure to the object on the movable body is completed until when the object is carried out of the movable body and another object is carried in.

173. The pattern forming apparatus of claim 168, further comprising:

another movable body that moves independently from the movable body within the plane; and

a reference member that is mounted on the another movable body, and on which a pair of reference gratings that are placed apart in a direction parallel to the second axis and whose periodic direction is a direction parallel to the first axis, and a plurality of reference marks in an area between the pair of reference gratings that can be simultaneously detected by the plurality of mark detecting systems are formed.

174. The pattern forming apparatus of claim 173, wherein

the reference member is kinematically supported on the another movable body.

175. The pattern forming apparatus of claim 173, wherein

relative position measurement of the second mark detecting system with respect to the first mark detecting system is performed by simultaneously detecting the plurality of reference marks with the first and second mark detecting systems.

176. The pattern forming apparatus of claim 173, wherein

a state of the movable body and the another movable body can be switched to a first state where both the movable bodies are closer together at a predetermined distance or less and a second state where both the movable bodies are separate, and

the pattern forming apparatus further comprises

an optical system that projects an image of the pattern;

and

a controller that starts measurement of a positional relation between a projection position of an image of the pattern by the optical system and a detection center of the first mark detecting system in the first state and ends the measurement in the seconds state.

177. The pattern forming apparatus of claim 168, wherein

simultaneous detection of the marks by the plurality of mark detecting systems is performed a plurality of times while changing a focus state with respect to the plurality of marks on the object.

178. The pattern forming apparatus of claim 164, wherein

on the movable body, the first grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the second axis and also the second grating is formed in pairs spaced apart at a predetermined distance in a direction parallel to the first axis, and

the pattern forming apparatus further comprises

a measuring unit that measures position information of the movable body in directions parallel to the first and second axes and rotation information within the plane, based on measurement values of two first axis encoders that have a plurality of first heads at least each one of which faces the pair of first gratings and whose positions are different in a direction parallel to the second axis, and of two second axis encoders that have a plurality of second heads at least each one of which faces the pair of second gratings and whose positions are different in a direction parallel to the first axis.

179. The pattern forming apparatus of claim 164, wherein

the pattern is formed on the object by exposing the object with an energy beam.

180. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another; and

a plurality of mark detecting systems whose detection areas are placed at different positions in a direction parallel to the second axis, and that simultaneously detect the marks at positions different from one another on the object, wherein

the number of marks on the object that are simultaneously detected by the plurality of mark detecting systems differs depending on a position of the movable body within the plane.

181. The pattern forming apparatus of claim 180, wherein

the plurality of mark detecting systems each detect a plurality of marks that are arrayed along a direction parallel to the first axis and are sequentially placed within the detection area of each of the mark detecting systems along with an operation in which the movable body moves in a direction parallel to the first axis.

182. The pattern forming apparatus of claim 180, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

183. The pattern forming apparatus of claim 182, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

184. The pattern forming apparatus of claim 180, wherein

the pattern is formed on the object by exposing the object with an energy beam.

185. A pattern forming apparatus that forms a pattern on an object using an optical system, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a mark detecting system that detects a plurality of marks formed on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that controls the adjusting unit so that the adjusting unit adjusts the optical properties based on detection results of a plurality of marks on the object that have been detected by the mark detecting system, at the stage where marks on the object to be detected by the mark detecting system remain.

186. The pattern forming apparatus of claim 185, wherein

at the stage where the mark detecting system finishes detecting a half of the marks to be detected on the object, the controller controls the adjusting unit so that the adjusting unit adjusts the optical properties based on detection results of the half of the marks.

187. The pattern forming apparatus of claim 185, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis, and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

188. The pattern forming apparatus of claim 187, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

189. The pattern forming apparatus of claim 185, wherein

the pattern is formed on the object by exposing the object with an energy beam.

190. A pattern forming apparatus that projects a pattern on an object using an optical system, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a mark detecting system that detects marks on the object mounted on the movable body; and

a controller that performs a detection operation of the marks on the object during a period from when an operation of measuring a positional relation between a projection position of the pattern by the optical system and a detection center of the mark detecting system is started until when the operation is completed.

191. The pattern forming apparatus of claim 190, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

192. The pattern forming apparatus of claim 191, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

193. The pattern forming apparatus of claim 190, wherein

the pattern is formed on the object by exposing the object with an energy beam.

194. A pattern forming apparatus that projects a pattern on an object using an optical system, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a mark detecting system that detects marks on the object mounted on the movable body; and

a controller that performs a measurement operation of a positional relation between a projection position of the pattern by the optical system and a detection center of the mark detecting system during a period from when a detection operation of a plurality of marks to be detected formed on the object is started until before the operation is completed.

195. The pattern forming apparatus of claim 194, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

196. The pattern forming apparatus of claim 195, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

197. The pattern forming apparatus of claim 194, wherein

the pattern is formed on the object by exposing the object with an energy beam.

198. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object;

a second movable body that moves independently from the first movable body within the plane;

a mark detecting system that detects a plurality of marks to be detected formed on the object mounted on the first movable body; and

a controller that controls the first movable body and the second movable body so that state switching is performed between a proximity state of making both the movable bodies come closer together at a predetermined distance or less and a separation state of separating both the movable bodies, wherein

the controller performs an operation of the state switching during a period from when a detection operation of the plurality of marks to be detected formed on the object is started until before the detection operation is completed.

199. The pattern forming apparatus of claim 198, wherein

when both the movable bodies are in the proximity state, the detection operation of the plurality of marks on the object by the mark detecting system is started, and

the controller controls both the movable bodies so that the state of both the movable bodies shifts from the proximity state to the separation state, before the detection operation of all the plurality of marks is completed.

200. The pattern forming apparatus of claim 198, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

201. The pattern forming apparatus of claim 200, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

202. The pattern forming apparatus of claim 198, wherein

the pattern is formed on the object by exposing the object with an energy beam.

203. A pattern forming apparatus that forms a pattern on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another;

a plurality of mark detecting systems that each detect the marks at positions different from one another on the object;

a focus position changing unit that changes a relative positional relation between the plurality of mark detecting systems and the object mounted on the movable body in optical axis directions of the plurality of mark detecting systems that are perpendicular to the plane, simultaneously among the plurality of mark detecting systems; and

a controller that simultaneously detects each of the marks formed at positions different from one another on the object using the plurality of mark detecting systems corresponding to each of the marks, while changing the relative positional relation in the optical axis directions by the focus position changing unit.

204. The pattern forming apparatus of claim 203, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in directions parallel to the first axis and the second axis are arranged, and

the pattern forming apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating section.

205. The pattern forming apparatus of claim 204, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

206. The pattern forming apparatus of claim 203, wherein

the pattern is formed on the object by exposing the object with an energy beam.

207. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object;

a mark detecting system that has a plurality of detection areas whose positions are different in the second direction; and

a detecting unit that has a detection area at a position different from the plurality of detection areas in the first direction, and detects position information of the object in a third direction orthogonal to the first and second directions at a plurality of detection points whose positions are different in the second direction.

208. The exposure apparatus of claim 207, wherein

the detection area of the detecting unit is placed between an irradiation position of the energy beam and the plurality of detection areas of the mark detecting system in the first direction.

209. The exposure apparatus of claim 207, further comprising:

a controller that performs at least a part of detection operations of the mark detecting system and the detecting unit in parallel, and also moves the movable body in the first direction at the time of each of the detection operations.

210. The exposure apparatus of claim 207, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in the first and second directions are arranged, and

the exposure apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads whose positions are different in the second direction and measures position information of the movable body in the first direction by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in the first direction and measures position information of the movable body in the second direction by the second head that faces the second grating section.

211. The exposure apparatus of claim 210, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

the measuring unit includes at least one of the first and second encoders in pairs that correspond to the at least one of the grating sections.

212. The exposure apparatus of claim 210, wherein

at the time of detection operations of the mark detecting systems and/or the detecting unit, position information of the movable body is measured by the measuring unit.

213. The exposure apparatus of claim 210, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and a measurement direction of position information of the movable body by the interferometer includes a direction different from a measurement direction of position information of the movable body by the encoder.

214. The exposure apparatus of claim 213, wherein

the interferometer measures position information of the movable body in a direction different from directions within the plane.

215. The exposure apparatus of claim 213, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

216. The exposure apparatus of claim 210, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and

the exposure apparatus further comprises

a controller that controls movement of the movable body based on measurement information of the measuring unit that includes position information measured by the interferometer.

217. The exposure apparatus of claim 216, wherein

the measurement information includes position information of the movable body by the interferometer in a direction different from a measurement direction of position information of the movable body by the encoder.

218. The exposure apparatus of claim 207, wherein

on a surface of the movable body substantially parallel to the plane, a pair of first grating sections that each have a grating periodically arrayed in the first direction are arranged, and

the exposure apparatus further comprises

a measuring unit that includes a first encoder that has a plurality of first heads including a pair of first heads that are placed with the plurality of detection areas in between in the second direction, and measures position information of the movable body in the first direction by the first head that faces at least one of the pair of first grating sections.

219. The exposure apparatus of claim 218, wherein

on the surface of the movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged, and

the measuring unit includes a second encoder that has a plurality of second heads whose positions are different in the first direction and measures position information of the movable body in the second direction by the second head that faces the second grating section.

220. The exposure apparatus of claim 218, wherein

the plurality of first heads include the first heads in first and second groups whose positions are different from positions of the pair of first heads in the first direction, and also whose positions are each different in the second direction, and

at least one of the first heads in the first group faces one of the pair of first grating sections, and at least one of the first heads in the second group faces the other of the pair of first grating sections.

221. The exposure apparatus of claim 220, wherein

the first heads in the first and second groups are placed with an irradiation position of the energy beam in between in the second direction.

222. The exposure apparatus of claim 218, further comprising:

another movable body separate from the movable body that has a surface on which a reference member that has a pair of reference gratings placed apart in the second direction and a plurality of reference marks placed between the pair of reference gratings is arranged, wherein

detection of the pair of reference gratings by the pair of the first heads and detection of the plurality of reference marks by the mark detecting system can be simultaneously executed.

223. The exposure apparatus of claim 218, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and a measurement direction of position information of the movable body by the interferometer includes a direction different from a measurement direction of position information of the movable body by the encoder.

224. The exposure apparatus of claim 223, wherein

the interferometer measures position information of the movable body in a direction different from directions within the plane.

225. The exposure apparatus of claim 223, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

226. The exposure apparatus of claim 218, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and

the exposure apparatus further comprises

a controller that controls movement of the movable body based on measurement information of the measuring unit that includes position information measured by the interferometer.

227. The exposure apparatus of claim 226, wherein

the measurement information includes position information of the movable body by the interferometer in a direction different from a measurement direction of position information of the movable body by the encoder.

228. The exposure apparatus of claim 207, further comprising:

an optical member that is placed facing the object and emits the energy beam;

another movable body separate from the movable body; and

a liquid immersion system that forms a liquid immersion area by filling a space between the optical member and the object with liquid, wherein

the liquid immersion area is maintained in a space between the optical member and a surface of the another movable body that is placed facing the optical member by replacement of the movable body.

229. The exposure apparatus of claim 228, wherein

the plurality of detection areas and the liquid immersion area are placed apart in the first direction, and the liquid immersion area is moved between a surface of the movable body and a surface of the another movable body.

230. The exposure apparatus of claim 207, wherein

at the time of an exposure operation of the object with the energy beam, position information of the movable body is measured by the measuring unit.

231. The exposure apparatus of claim 207, wherein relative positions of the plurality of detection areas of the mark detecting system are variable in at least the second direction.

232. The exposure apparatus of claim 231, wherein

the mark detecting system has the odd number of the detection areas, and at least one of the odd number of the detection areas is movable in the second direction except for the detection area placed in the center in the second direction.

233. The exposure apparatus of claim 231, further comprising:

a position adjusting unit that adjusts a position of at least one of the plurality of detection areas by moving a part of the mark detecting system.

234. The exposure apparatus of claim 207, further comprising:

a controller that detects marks in a plurality of groups whose positions are different in the first direction on the object with the mark detecting system per each of the groups, by moving the movable body in the first direction, wherein

at least marks in one group out of the marks in the plurality of groups include a plurality of marks whose positions are different in the second direction.

235. The exposure apparatus of claim 207, wherein

the marks whose positions are different in the first direction on the object are detected with the mark detecting system by moving the movable body in the first direction, and also the number of marks detected by the mark detecting system differs depending on a position of the object in the first direction.

236. The exposure apparatus of claim 235, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

237. The exposure apparatus of claim 235, wherein

relative positions of the plurality of detection areas in the second direction of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

238. The exposure apparatus of claim 207, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, controls the adjusting unit based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

239. The exposure apparatus of claim 207, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object; and

a controller that performs one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of the mark detecting system and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations.

240. The exposure apparatus of claim 239, wherein

the controller performs the detection operation of the marks during the measurement operation of the positional relation.

241. The exposure apparatus of claim 239, wherein

the controller performs the measurement operation of the positional relation during the detection operation of the marks.

242. The exposure apparatus of claim 207, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

243. The exposure apparatus of claim 242, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

244. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 207;

and developing the exposed object.

245. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object, and has a surface substantially parallel to the plane on which a pair of first grating sections that each have a grating periodically arrayed in the first direction are arranged;

a mark detecting system that has a plurality of detection areas whose positions are different in the second direction; and

a measuring unit that includes a first encoder that has a plurality of first heads including a pair of first heads that are placed with the plurality of detection areas in between in the second direction, and measures position information of the movable body in the first direction by the first head that faces at least one of the pair of first grating sections.

246. The exposure apparatus of claim 245, wherein

on the surface of the movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged, and

the measuring unit includes a second encoder that has a plurality of second heads whose positions are different in the first direction and measures position information of the movable body in the second direction by the second head that faces the second grating section.

247. The exposure apparatus of claim 245, wherein

at the time of a detection operation by the mark detecting system, position information of the movable body is measured by the measuring unit.

248. The exposure apparatus of claim 245, wherein

the plurality of first heads include the first heads in first and second groups whose positions are different from positions of the pair of first heads in the first direction, and also whose positions are each different in the second direction, and

at least one of the first heads in the first group faces one of the pair of first grating sections, and at least one of the first heads in the second group faces the other of the pair of first grating sections.

249. The exposure apparatus of claim 248, wherein

the first heads in the first and second groups are placed with an irradiation position of the energy beam in between in the second direction.

250. The exposure apparatus of claim 245, further comprising:

another movable body separate from the movable body that has a surface on which a reference member that has a pair of reference gratings placed apart in the second direction and a plurality of reference marks placed between the pair of reference gratings is arranged, wherein

detection of the pair of reference gratings by the pair of the first heads and detection of the plurality of reference marks by the mark detecting system can be simultaneously executed.

251. The exposure apparatus of claim 245, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and a measurement direction of position information of the movable body by the interferometer includes a direction different from a measurement direction of position information of the movable body by the encoder.

252. The exposure apparatus of claim 251, wherein

the interferometer measures position information of the movable body in a direction different from directions within the plane.

253. The exposure apparatus of claim 251, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

254. The exposure apparatus of claim 245, wherein

the measuring unit includes an interferometer that measures position information of the movable body, and

the exposure apparatus further comprises

a controller that controls movement of the movable body based on measurement information of the measuring unit that includes position information measured by the interferometer.

255. The exposure apparatus of claim 254, wherein

the measurement information includes position information of the movable body by the interferometer in a direction different from a measurement direction of position information of the movable body by the encoder.

256. The exposure apparatus of claim 245, further comprising:

an optical member that is placed facing the object and emits the energy beam;

another movable body separate from the movable body; and

a liquid immersion system that forms a liquid immersion area by filling a space between the optical member and the object with liquid, wherein

the liquid immersion area is maintained in a space between the optical member and a surface of the another movable body that is placed facing the optical member by replacement of the movable body.

257. The exposure apparatus of claim 256, wherein

the plurality of detection areas and the liquid immersion area are placed apart in the first direction, and the liquid immersion area is moved between a surface of the movable body and a surface of the another movable body.

258. The exposure apparatus of claim 245, wherein

at the time of an exposure operation of the object with the energy beam, position information of the movable body is measured by the measuring unit.

259. The exposure apparatus of claim 245, wherein

relative positions of the plurality of detection areas of the mark detecting system are variable in at least the second direction.

260. The exposure apparatus of claim 259, wherein

the mark detecting system has the odd number of the detection areas, and at least one of the odd number of the detection areas is movable in the second direction except for the detection area placed in the center in the second direction.

261. The exposure apparatus of claim 259, further comprising:

a position adjusting unit that adjusts a position of at least one of the plurality of detection areas by moving a part of the mark detecting system.

262. The exposure apparatus of claim 245, further comprising:

a controller that detects marks in a plurality of groups whose positions are different in the first direction on the object with the mark detecting system per each of the groups, by moving the movable body in the first direction, wherein

at least marks in one group out of the marks in the plurality of groups include a plurality of marks whose positions are different in the second direction.

263. The exposure apparatus of claim 245, wherein

the marks whose positions are different in the first direction on the object are detected with the mark detecting system by moving the movable body in the first direction, and also the number of marks detected by the mark detecting system differs depending on a position of the object in the first direction.

264. The exposure apparatus of claim 263, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

265. The exposure apparatus of claim 263, wherein

relative positions of the plurality of detection areas in the second direction of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

266. The exposure apparatus of claim 245, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, controls the adjusting unit based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

267. The exposure apparatus of claim 245, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object; and

a controller that performs one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of the mark detecting system and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations.

268. The exposure apparatus of claim 267, wherein

the controller performs the detection operation of the marks during the measurement operation of the positional relation.

269. The exposure apparatus of claim 267, wherein

the controller performs the measurement operation of the positional relation during the detection operation of the marks.

270. The exposure apparatus of claim 245, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

271. The exposure apparatus of claim 270, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

272. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 245;

and

developing the exposed object.

273. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object; and

a mark detecting system that has a plurality of detection areas whose positions are different in the second direction and can simultaneously detect a plurality of marks on the object, wherein

the marks whose positions are different in the first direction on the object are detected with the mark detecting system by moving the movable body in the first direction, and also the number of marks detected by the mark detecting system differs depending on a position of the object in the first direction.

274. The exposure apparatus of claim 273, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

275. The exposure apparatus of claim 273, wherein

relative positions of the plurality of detection areas in the second direction of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

276. The exposure apparatus of claim 273, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, controls the adjusting unit based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

277. The exposure apparatus of claim 273, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object; and

a controller that performs one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of the mark detecting system and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations.

278. The exposure apparatus of claim 277, wherein

the controller performs the detection operation of the marks during the measurement operation of the positional relation.

279. The exposure apparatus of claim 277, wherein

the controller performs the measurement operation of the positional relation during the detection operation of the marks.

280. The exposure apparatus of claim 273, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

281. The exposure apparatus of claim 280, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

282. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 273;

and

developing the exposed object.

283. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object, and also has a surface substantially parallel to the plane on which a grating section that has a grating periodically arrayed is arranged;

a mark detecting system that detects marks on the object; and

a measuring unit that has an encoder that has a plurality of heads whose positions are different in a direction intersecting an array direction of the grating, and measures position information of the movable body in the array direction by the head that faces the grating section at the time of a detection operation of the marks.

284. The exposure apparatus of claim 283, wherein

the grating section includes first and second grating sections that have the gratings periodically placed in the first and second directions, and

the encoder includes a first encoder that has a plurality of first heads whose positions are different in the second direction and measures position information of the movable body in the first direction by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in the first direction and measures position information of the movable body in the second direction by the second head that faces the second grating section.

285. The exposure apparatus of claim 284, further comprising:

a correction unit that corrects a measurement error of the encoder that occurs due to at least one of the first grating section and the second grating section.

286. The exposure apparatus of claim 283, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, controls the adjusting unit based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

287. The exposure apparatus of claim 283, further comprising:

an optical system that projects a pattern that is illuminated with the energy beam on the object; and

a controller that performs one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of the mark detecting system and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations.

288. The exposure apparatus of claim 287, wherein

the controller performs the detection operation of the marks during the measurement operation of the positional relation.

289. The exposure apparatus of claim 287, wherein

the controller performs the measurement operation of the positional relation during the detection operation of the marks.

290. The exposure apparatus of claim 283, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

291. The exposure apparatus of claim 290, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

292. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 283;

and

developing the exposed object.

293. An exposure apparatus that exposes an object with an energy beam via an optical system, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object;

a mark detecting system that detects marks on the object;

an adjusting unit that adjusts optical properties of the optical system; and

a controller that, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, controls the adjusting unit based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

294. The exposure apparatus of claim 293, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

295. The exposure apparatus of claim 294, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

296. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 293;

and

developing the exposed object.

297. An exposure apparatus that exposes an object with a pattern that is illuminated with an energy beam via an optical system, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object;

a mark detecting system that detects marks on the object; and

a controller that performs one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of the mark detecting system and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations

298. The exposure apparatus of claim 297, wherein

the controller performs the detection operation of the marks during the measurement operation of the positional relation.

299. The exposure apparatus of claim 297, wherein

the controller performs the measurement operation of the positional relation during the detection operation of the marks.

300. The exposure apparatus of claim 297, further comprising:

another movable body separate from the movable body, wherein

a first state of making the movable body and the another movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

301. The exposure apparatus of claim 300, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

302. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 297;

and

developing the exposed object.

303. An exposure apparatus that exposes an object with an energy beam, the apparatus comprising:

a movable body that is movable in first and second directions within a predetermined plane, holding the object;

a mark detecting system that detects marks on the object; and

a controller that can set a first state of making the movable body and another movable body different from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies, and performs switching between the first and second states during a detection operation of the marks by the mark detecting system.

304. The exposure apparatus of claim 303, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and

the controller switches the first state to the second state during the detection operation of the marks.

305. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 303;

and

developing the exposed object.

306. An exposure apparatus that exposes an object held on a movable body that is movable in first and second directions within a predetermined plane, with an energy beam, the apparatus comprising:

a mark detecting system that has a plurality of detection areas whose positions are different in the second direction; and

a reference member on which a plurality of reference marks that can be simultaneously detected by the mark detecting system are formed, and that can move from a side that is opposite to the plurality of detection areas with an irradiation position of the energy beam in between in the first direction to a position of the plurality of detection areas.

307. The exposure apparatus of claim 306, wherein

the reference member is attached to the movable body or another movable body that moves within the plane independently from the movable body.

308. A device manufacturing method, comprising:

exposing an object using the exposure apparatus of claim 306;

and

developing the exposed object.

309. A mark detecting apparatus that detects marks on an object, the apparatus comprising:

a mark detecting system that detects marks on the object mounted on a movable body, the movable body moving within a predetermined plane that includes a first axis and a second axis intersecting the first axis, and also having a surface on which a first grating having a grating whose periodic direction is a direction parallel to the first axis and a second grating having a grating whose periodic direction is a direction parallel to the second axis are arranged;

a measuring unit that has a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating, and a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating; and

a controller that detects the marks on the object using the mark detecting system while controlling a position of the movable body based on measurement values by the measuring unit.

310. A mark detecting apparatus that detects marks on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another; and

a plurality of mark detecting systems that have a plurality of detection areas whose positions are different in a direction parallel to the second axis and can simultaneously detect the marks at positions different from one another on the object, wherein

the number of marks on the object that are simultaneously detected by the plurality of mark detecting systems differs depending on a position within the plane of the movable body that mounts the object.

311. A mark detecting apparatus that detects marks on an object, the apparatus comprising:

a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis, holding the object on which marks are each formed at a plurality of positions different from one another;

a plurality of mark detecting systems that each detect the marks at positions different from one another on the object;

a focus position changing unit that changes a relative positional relation between the plurality of mark detecting systems and the object mounted on the movable body in optical axis directions of the plurality of mark detecting systems that are perpendicular to the plane, simultaneously among the plurality of mark detecting systems; and

a controller that simultaneously detects each of the marks formed at positions different from one another on the object using a plurality of mark detecting systems corresponding to each of the marks, while changing the relative positional relation in the optical axis directions by the focus position changing unit.

312. A pattern forming method of forming a pattern on an object, the method comprising:

a detection process of detecting marks on the object mounted on a movable body using a mark detecting system, the movable body moving within a predetermined plane that includes a first axis and a second axis intersecting the first axis, and also having a surface on which a first grating having a grating whose periodic direction is a direction parallel to the first axis and a second grating having a grating whose periodic direction is a direction parallel to the second axis are arranged, wherein

in the detection process, on detection of the marks, a position of the movable body is controlled based on measurement values by a measuring unit that has a first axis encoder that has a plurality of first heads whose positions are different in a direction parallel to the second axis and measures position information of the movable body in a direction parallel to the first axis by the first head that faces the first grating, and a second axis encoder that has a plurality of second heads whose positions are different in a direction parallel to the first axis and measures position information of the movable body in a direction parallel to the second axis by the second head that faces the second grating.

313. The pattern forming method of claim 312, further comprising:

a measurement process of measuring a positional relation between a projection position of the pattern by an optical system and a detection center of the mark detecting system, using a fiducial mark formed on the movable body, wherein

in the measurement process, when measuring the positional relation, a position of the movable body is controlled based on the measurement values by the measuring unit.

314. The pattern forming method of claim 312, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

315. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 312;

and

a process of performing processing to an object on which the pattern is formed.

316. A pattern forming method of forming a pattern on an object, the method comprising:

a process of mounting the object, on which marks are each formed at a plurality of positions different from one another, on a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis; and

a process of simultaneously detecting the marks at positions different from one another on the object using a plurality of mark detecting systems whose detection areas are placed at different positions in a direction parallel to the second axis, wherein

the number of marks on the object that are simultaneously detected by the plurality of mark detecting systems differs depending on a position of the movable body within the plane.

317. The pattern forming method of claim 316, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

318. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 316;

and

a process of performing processing to an object on which the pattern is formed.

319. A pattern forming method of forming a pattern on an object using an optical system, the method comprising:

a process of mounting the object on a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis;

a process of detecting a plurality of marks formed on the object using a mark detecting system; and

a process of adjusting optical properties of the optical system based on detection results of a plurality of marks on the object that have been detected by the mark detecting system, at the stage where marks on the object to be detected by the mark detecting system remain.

320. The pattern forming method of claim 319, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

321. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 319;

and

a process of performing processing to an object on which the pattern is formed.

322. A pattern forming method of projecting a pattern on an object using an optical system, the method comprising:

a process of mounting the object on a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis; and

a process of performing a detection operation of marks on the object during a period from when an operation of measuring a positional relation between a projection position of the pattern by the optical system and a detection center of a mark detecting system is started until when the operation is completed.

323. The pattern forming method of claim 322, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

324. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 322;

and

a process of performing processing to an object on which the pattern is formed.

325. A pattern forming method of projecting a pattern on an object using an optical system, the method comprising:

a process of mounting the object on a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis; and

a process of performing a measurement operation of a positional relation between a projection position of the pattern by the optical system and a detection center of a mark detecting system during a period from when an operation of detecting a plurality of marks to be detected formed on the object mounted on the movable body using the mark detecting system is started until before the operation is completed.

326. The pattern forming method of claim 325, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

327. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 325;

and

a process of performing processing to an object on which the pattern is formed.

328. A pattern forming method of forming a pattern on an object, the method comprising:

a process of mounting the object on a first movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis; and

a process of controlling both the first movable body and a second movable body that moves independently from the first movable body within the plane so that a detection operation by a mark detecting system of a plurality of marks to be detected formed on the object mounted on the first movable body is started when both the movable bodies are in a proximity state where both the movable bodies are closer together at a predetermined distance or less, and state switching is performed from the proximity state to a separation state where both the movable bodies separate from each other before all the detection operation of the plurality of marks is completed.

329. The pattern forming method of claim 328, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

330. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 328;

and

a process of performing processing to an object on which the pattern is formed.

331. A pattern forming method of forming a pattern on an object, the method comprising:

a process of mounting the object, on which marks are each formed at a plurality of positions different from one another, on a movable body that moves within a predetermined plane that includes a first axis and a second axis intersecting the first axis; and

a process of simultaneously measuring each of the marks formed at positions different from one another on the object individually using a plurality of mark detecting systems corresponding to each of the marks, while changing a relative positional relation between the plurality of mark detecting systems and the object mounted on the movable body in optical axis directions of the plurality of mark detecting systems that are perpendicular to the plane, simultaneously among the plurality of mark detecting systems.

332. The pattern forming method of claim 331, further comprising:

a process of forming the pattern on the object by exposing the object with an energy beam.

333. A device manufacturing method, comprising:

a process of forming a pattern on an object using the pattern forming method of claim 331;

and

a process of performing processing to an object on which the pattern is formed.

334. An exposure method of exposing an object with an energy beam, the method comprising:

a first process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane;

a second process of detecting marks on the object using a mark detecting system that has a plurality of detection areas whose positions are different in the second direction; and

a third process of detecting position information of the object in a third direction orthogonal to the first and second directions, using a detecting unit that has a detection area at a position different from the plurality of detection areas in the first direction and has a plurality of detection points whose positions are different in the second direction.

335. The exposure method of claim 334, wherein

the detection area of the detecting unit is placed between an irradiation position of the energy beam and the plurality of detection areas of the mark detecting system in the first direction.

336. The exposure method of claim 334, further comprising:

at least a part of detection operations in the second and third processes is performed in parallel and the movable body is moved in the first direction at the time of each of the detection operations.

337. The exposure method of claim 334, wherein

on a surface of the movable body substantially parallel to the plane, first and second grating sections that have gratings periodically arrayed in the first and second directions are arranged, and

in at least one of the second and third processes, by using a measuring unit that has a first encoder that has a plurality of first heads whose positions are different in the second direction and a second encoder that has a plurality of second heads whose positions are different in the first direction, position information of the movable body in the first direction is measured by the first head that faces the first grating section and position information of the movable body in the second direction is measured by the second head that faces the second grating section.

338. The exposure method of claim 337, wherein

at least one of the first and second grating sections is arranged in pairs spaced apart in a direction orthogonal to a direction in which the grating is periodically arrayed, and

at least one of the first and second encoders that corresponds to the at least one of the grating sections is arranged in pairs.

339. The exposure method of claim 337, wherein

at the time of detection operations by the mark detecting systems and/or the detecting unit, position information of the movable body is measured by the measuring unit.

340. The exposure method of claim 337, wherein

position information of the movable body in a plurality of measurement directions that include a direction different from a measurement direction of position information of the movable body by the encoder is further measured using an interferometer.

341. The exposure method of claim 340, wherein

the direction different from the measurement direction of position information of the movable body by the encoder includes a direction different from directions within the plane.

342. The exposure method of claim 340, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

343. The exposure method of claim 334, wherein

on a surface of the movable body substantially parallel to the plane, a pair of first grating sections that each have a grating periodically arrayed in the first direction is arranged, and

in at least one of the second and third processes, by using a measuring unit that includes a first encoder that has a plurality of first heads including a pair of first heads that are placed with the plurality of detection areas in between in the second direction, position information of the movable body in the first direction is measured by the first head that faces at least one of the pair of first grating sections.

344. The exposure method of claim 343, wherein

on the surface of the movable body, a second grating section that has a grating periodically arrayed in the second direction is arranged,

the measuring unit further includes a second encoder that has a plurality of second heads whose positions are different in the first direction, and

in at least one of the second and third processes, position information of the movable body in the second direction is measured by the second head that faces the second grating section.

345. The exposure method of claim 343, wherein

on a surface of another movable body that is separate from the movable body, a reference member that has a pair of reference gratings placed apart in the second direction and a plurality of reference marks placed between the pair of reference gratings is arranged, and

the exposure method further comprises

a process of simultaneously executing detection of the pair of reference gratings by the pair of first heads and detection of the plurality of reference marks by the mark detecting system.

346. The exposure method of claim 343, wherein

position information of the movable body in a plurality of measurement directions that include a direction different from a measurement direction of position information of the movable body by the encoder is further measured using an interferometer.

347. The exposure method of claim 346, wherein

the direction different from the measurement direction of position information of the movable body by the encoder includes a direction different from directions within the plane.

348. The exposure method of claim 346, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

349. The exposure method of claim 334, wherein

at the time of an exposure operation of the object with the energy beam, position information of the movable body is measured by the measuring unit.

350. The exposure method of claim 334, wherein

marks in a plurality of groups whose positions are different in the first direction on the object are detected using the mark detecting system per each of the groups, by moving the movable body in the first direction.

351. The exposure method of claim 350, wherein

at least marks in one group out of the marks in the plurality of groups include a plurality of marks whose positions are different in the second direction.

352. The exposure method of claim 334, wherein

the marks whose positions are different in the first direction on the object are detected by the mark detecting systems by moving the movable body in the first direction, and also the number of marks that are detected by the mark detecting system differs depending on a position of the object in the first direction.

353. The exposure method of claim 352, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

354. The exposure method of claim 352, wherein

relative positions in the second direction of the plurality of detection areas of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

355. The exposure method of claim 334, further comprising:

a process of, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, adjusting optical properties of an optical system that projects a pattern that is illuminated with the energy beam on the object, based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

356. The exposure method of claim 334, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

357. The exposure method of claim 356, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

358. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 334;

and

developing the exposed object.

359. An exposure method of exposing an object with an energy beam, the method comprising:

a first process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane; and

a second process of, when marks on the object are detected using a mark detecting system that has a plurality of detection areas whose positions are different in the second direction, by using a measuring unit that includes a first encoder that has a plurality of first heads including a pair of first heads that are placed with the plurality of detection areas in between in the second direction, measuring position information of the movable body in the first direction by the first head that faces at least one of a pair of first grating sections that are arranged on a surface of the movable body substantially parallel to the plane and each have a grating periodically arrayed in the first direction.

360. The exposure method of claim 359, wherein

the measuring unit further includes a second encoder that has a plurality of second heads whose positions are different in the first direction, and

in the second process, position information of the movable body in the second direction is measured by the second head that faces a second grating section that has a grating periodically arrayed in the second direction on the surface of the movable body.

361. The exposure method of claim 359, wherein

on a surface of another movable body that is separate from the movable body, a reference member that has a pair of reference gratings placed apart in the second direction and a plurality of reference marks placed between the pair of reference gratings is arranged, and

the exposure method further comprises

a process of simultaneously executing detection of the pair of reference gratings by the pair of first heads and detection of the plurality of reference marks by the mark detecting system.

362. The exposure method of claim 359, wherein

position information of the movable body in a plurality of measurement directions that include a direction different from a measurement direction of position information of the movable body by the encoder is further measured using an interferometer.

363. The exposure method of claim 362, wherein

the direction different from the measurement direction of position information of the movable body by the encoder includes a direction different from directions within the plane.

364. The exposure method of claim 362, wherein

the interferometer measures position information of the movable body in at least one measurement direction of position information of the movable body by the encoder.

365. The exposure method of claim 359, wherein

at the time of an exposure operation of the object with the energy beam, position information of the movable body is measured by the measuring unit.

366. The exposure method of claim 359, wherein

marks in a plurality of groups whose positions are different in the first direction on the object are detected using the mark detecting system per each of the groups, by moving the movable body in the first direction.

367. The exposure method of claim 366, wherein

at least marks in one group out of the marks in the plurality of groups include a plurality of marks whose positions are different in the second direction.

368. The exposure method of claim 359, wherein

the marks whose positions are different in the first direction on the object are detected by the mark detecting systems by moving the movable body in the first direction, and also the number of marks that are detected by the mark detecting system differs depending on a position of the object in the first direction.

369. The exposure method of claim 368, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

370. The exposure method of claim 368, wherein

relative positions in the second direction of the plurality of detection areas of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

371. The exposure method of claim 359, further comprising:

a process of, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, adjusting optical properties of an optical system that projects a pattern that is illuminated with the energy beam on the object, based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

372. The exposure method of claim 359, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

373. The exposure method of claim 372, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

374. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 359;

and

developing the exposed object.

375. An exposure method of exposing on an object with an energy beam, the method comprising:

a first process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane; and

a second process of, when marks whose positions are different in the first direction on the object are detected by moving the movable body in the first direction, detecting the different number of marks depending on a position of the object in the first direction, using a mark detecting system that has a plurality of detection areas whose positions are different in the second direction.

376. The exposure method of claim 375, wherein

the mark detecting system detects a plurality of marks whose positions are substantially the same in the second direction on the object that is moved in the first direction, in one of the plurality of detection areas.

377. The exposure method of claim 375, wherein

relative positions in the second direction of the plurality of detection areas of the mark detecting system are adjusted in accordance with positions of the marks in the second direction on the object that is moved in the first direction.

378. The exposure method of claim 375, further comprising:

a process of, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, adjusting optical properties of an optical system that projects a pattern that is illuminated with the energy beam on the object, based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

379. The exposure method of claim 375, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

380. The exposure method of claim 379, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

381. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 375;

and

developing the exposed object.

382. An exposure method of exposing an object with an energy beam, the method comprising:

a process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane, and also has a surface substantially parallel to the plane on which a grating section that has a grating periodically arrayed is arranged; and

a process of, by using a measuring unit that includes an encoder that has a plurality of heads whose positions are different in a direction intersecting an array direction of the grating, measuring position information of the movable body in the array direction by the head that faces the grating section, at the time of a detection operation of marks by a mark detecting system that detects the marks on the object.

383. The exposure method of claim 382, wherein

the grating section includes first and second grating sections that have the gratings periodically placed in the first and second directions, and

the encoder includes a first encoder that has a plurality of first heads whose positions are different in the second direction and measures position information of the movable body in the first direction by the first head that faces the first grating section, and a second encoder that has a plurality of second heads whose positions are different in the first direction and measures position information of the movable body in the second direction by the second head that faces the second grating section.

384. The exposure method of claim 383, further comprising:

a process of correcting a measurement error of the encoder that occurs due to at least one of the first grating section and the second grating section.

385. The exposure method of claim 382, further comprising:

a process of, in the middle of a detection operation of a plurality of marks on the object by the mark detecting system, adjusting optical properties of an optical system that projects a pattern that is illuminated with the energy beam on the object, based on detection results of a part of the plurality of marks that have been detected by the mark detecting system.

386. The exposure method of claim 382, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

387. The exposure method of claim 386, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

388. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 382;

and

developing the exposed object.

389. An exposure method of exposing an object with an energy beam via an optical system, the method comprising:

a process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane; and

a process of, in the middle of a detection operation of a plurality of marks on the object, controlling an adjusting unit that adjusts optical properties of the optical system based on detection results of a part of the plurality of marks that have been detected by then.

390. The exposure method of claim 389, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

391. The exposure method of claim 390, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

392. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 389;

and

developing the exposed object.

393. An exposure method of exposing an object with a pattern that is illuminated with an energy beam via an optical system, the method comprising:

a first process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane; and

a second process of performing one of a measurement operation of a positional relation between a projection position of the pattern and a detection center of a mark detecting system that detects marks on the object and a detection operation of the marks by the mark detecting system, in parallel with at least a part of the other of the operations.

394. The exposure method of claim 393, wherein

in the second process, the detection operation of the marks is performed during the measurement operation of the positional relation.

395. The exposure method of claim 393, wherein

in the second process, the measurement operation of the positional relation is performed during the detection operation of the marks.

396. The exposure method of claim 393, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

switching between the first and second states is performed during the detection operation of the marks by the mark detecting system.

397. The exposure method of claim 396, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

398. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 393;

and

developing the exposed object.

399. An exposure method of exposing an object with an energy beam, the method comprising:

a process of mounting the object on a movable body that is movable in first and second directions within a predetermined plane, wherein

a first state of making the movable body and another movable body separate from the movable body come closer together at a predetermined distance or less and a second state of separating both the movable bodies can be set, and

the exposure method further comprises

a process of performing switching between the first and second states during a detection operation of marks by a mark detecting system that detects the marks on the object.

400. The exposure method of claim 399, wherein

the detection operation of the marks is started when both the movable bodies are in the first state, and switching from the first state to the second state is performed during the detection operation of the marks.

401. A device manufacturing method, comprising:

exposing an object using the exposure method of claim 399;

and

developing the exposed object.