Alternating phase shift mask inspection using biased inspection data

• US 20080089575A1
• Filed: 10/13/2006
• Published: 04/17/2008
• Est. Priority Date: 10/13/2006
• Status: Active Grant

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Badger, Karen D., Hibbs, Michael S., Magg, Christopher K.
• Granted Patent: US 7,742,632 B2
• Time in Patent Office: Days
• US Class Current: 382/144
• CPC Class Codes: G03F 1/30 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
• CPC Class Codes: G03F 1/84 Inspecting

Abstract

An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates at a wavelength of light that is different from the wavelength of light that an inspection system uses to inspect the mask for defects.

Claims

1. A system for inspecting an alternating phase shift mask, comprising:

an optical scanner configured to scan the alternating phase shift mask and generate optical image data;

a database configured to store inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner; and

an image processor configured to determine if a defect is present in the alternating phase shift mask, wherein the image processor determines the presence of a defect by comparing the generated optical image data to the biased inspection data, wherein a variation between the generated optical image data and the biased inspection data that exceeds a user selectable threshold is indicative of a defect in the alternating phase shift mask.

2. The system according to claim 1, wherein the biased inspection data is based on data derived from optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask.

3. The system according to claim 2, wherein the biased inspection data is based on a difference in the optical scanning response of the phase shifted optical imaging data observed by the optical scanner and reference optical image data generated from design data.

4. The system according to claim 1, wherein the optical scanner utilizes a wavelength of light that is a mismatch with wavelength light used to expose the alternating phase shift mask during fabrication.

5. The system according to claim 4, wherein the optical scanner utilizes a non-actinic wavelength of light.

6. The system according to claim 1, wherein the image processor utilizes a die-to-database inspection methodology.

7. The system according to claim 1, further comprising a controller for controlling operation of the image processor.

8. A method for inspecting an alternating phase shift mask, comprising:

scanning the alternating phase shift mask with an optical scanner;

generating optical image data from the scan of the alternating phase shift mask;

retrieving inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner; and

determining if a defect is present in the alternating phase shift mask in accordance with the generated optical image data and the biased inspection data.

9. The method according to claim 8, wherein the determining of the presence of a defect comprises comparing the generated optical image data to the biased inspection data, wherein a variation between the generated optical image data and the biased inspection data that exceeds a user selectable threshold is indicative of a defect in the alternating phase shift mask.

10. The method according to claim 8, wherein the biased inspection data is based on data derived from phase shifted optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask.

11. The method according to claim 10, wherein the biased inspection data is based on a difference in the optical scanning response of the phase shifted optical imaging data observed by the optical scanner and reference optical image data generated from design data.

12. The method according to claim 8, wherein the scanning utilizes a wavelength of light that is a mismatch with wavelength light used to expose the alternating phase shift mask during fabrication.

13. The method according to claim 12, wherein the scanning utilizes a non-actinic wavelength of light.

14. The method according to claim 8, wherein the determining comprises utilizing a die-to-database inspection methodology.

15. A computer-readable medium storing computer instructions for enabling an optical inspection system to determine a defect in an alternating phase shift mask, the computer instructions comprising:

obtaining optical image data of the alternating phase shift mask generated from an optical scanner;

retrieving inspection data biased to compensate for the optical scanning response of the alternating phase shift mask with the optical scanner; and

determining if a defect is present in the alternating phase shift mask in accordance with the generated optical image data and the biased inspection data.

16. The computer-readable medium according to claim 15, wherein the determining of the presence of a defect comprises instructions for comparing the generated optical image data to the biased inspection data, wherein a variation between the generated optical image data and the biased inspection data that exceeds a user selectable threshold is indicative of a defect in the alternating phase shift mask.

17. The computer-readable medium according to claim 15, wherein the retrieved biased inspection data is based on data derived from phase shifted optical imaging data obtained from the optical scanner during a scan of a test alternating phase shift mask.

18. The computer-readable medium according to claim 17, wherein the biased inspection data is based on a difference in the optical scanning response of the phase shifted optical imaging data observed by the optical scanner and reference optical image data generated from design data.

19. The computer-readable medium according to claim 15, wherein the scanning utilizes a wavelength of light that is a mismatch with wavelength light used to expose the alternating phase shift mask during fabrication.

20. The computer-readable medium according to claim 15, wherein the determining comprises utilizing a die-to-database inspection methodology.