Thin film transistor for cross point memory and method of manufacturing the same
First Claim
Patent Images
1. A thin film transistor, comprising:
- a gate on a portion of a substrate;
a gate insulation layer on the substrate and the gate;
a channel including zinc oxide (ZnO) on the gate insulation layer over the gate; and
a source and a drain contacting opposing sides of the channel,wherein the thin film transistor is used as a selection transistor for a three-dimensional stacking cross point memory.
1 Assignment
0 Petitions
Accused Products
Abstract
A thin film transistor used as a selection transistor for a three-dimensional stacking cross point memory and a method of manufacturing the thin film transistor are provided. The thin film transistor includes a substrate, a gate, a gate insulation layer, a channel, a source and a drain. The gate may be formed on a portion of the substrate. The gate insulation layer may be formed on the substrate and the gate. The channel includes ZnO and may be formed on the gate insulation layer over the gate. The source and the drain contact sides of the channel.
87 Citations
17 Claims
-
1. A thin film transistor, comprising:
-
a gate on a portion of a substrate; a gate insulation layer on the substrate and the gate; a channel including zinc oxide (ZnO) on the gate insulation layer over the gate; and a source and a drain contacting opposing sides of the channel, wherein the thin film transistor is used as a selection transistor for a three-dimensional stacking cross point memory. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A method of manufacturing a thin film transistor, comprising:
-
forming a gate by depositing a conductive material on a portion of a substrate and patterning the deposited conductive material; depositing a gate insulation layer on the substrate and the gate; forming a channel on a portion of the gate insulation layer over the gate by depositing a channel material including zinc oxide (ZnO) on the gate insulation layer and patterning the deposited channel material; and forming a source and a drain contacting opposing sides of the channel by depositing a conductive material on the channel and the gate insulation layer and patterning the conductive material, wherein the thin film transistor is used as a selection transistor for a three-dimensional stacking cross point memory. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
-
Specification