IMAGE DISPLAY UNIT AND METHOD FOR MANUFACUTRE THE SAME
First Claim
1. An image display unit, comprising an active matrix substrate, which includes a plurality of gate lines deposited on an insulating substrate and a plurality of data lines prepared in matrix form on said plurality of gate lines, a plurality of pixels are deposited at intersections of said gate lines and said data lines and peripheral circuits including a driving circuit to drive said pixels are provided on outer side of a display region, which contains said plurality of pixels, there are provided a thin-film transistor and a storage capacitor on each of said pixels, and said active matrix substrate comprises a thin-film transistor on said peripheral circuit, wherein:
- said gate line has a laminated structure including a bottom layer metal film and a top layer metal film, and a top electrode of said storage capacitor is a metal film on the same layer as said bottom layer metal film to make up said gate lines.
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Abstract
The present invention provides an image display unit, which can be manufactured in shorter time by designing a thin-film transistor, by which it is possible to reduce the number of processes of ion implantation and photolithographic processes. A gate electrode GT is designed in a laminated structure of a thin bottom layer metal film GMB and a top layer metal film GMT, and a top electrode of a storage capacitor Cst is designed to have only the bottom layer metal film GMB. Ion implanter for the bottom electrode of the storage capacitor Cst is passed through the thin bottom layer metal film GMB, and ion implantation is performed at the same time as the ion implantation of source-drain electrodes. The gate electrode of PMOSTFT has also only the bottom layer metal GMB, and the ion implantation for threshold adjustment is performed by using the same resist. By designing the thin-film transistor and the storage capacitor in such structure, one process each can be reduced in the photolithographic process and in the ion implantation process, and an active matrix substrate for an image display unit can be manufactured in shorter time and at lower cost.
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Citations
9 Claims
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1. An image display unit, comprising an active matrix substrate, which includes a plurality of gate lines deposited on an insulating substrate and a plurality of data lines prepared in matrix form on said plurality of gate lines, a plurality of pixels are deposited at intersections of said gate lines and said data lines and peripheral circuits including a driving circuit to drive said pixels are provided on outer side of a display region, which contains said plurality of pixels, there are provided a thin-film transistor and a storage capacitor on each of said pixels, and said active matrix substrate comprises a thin-film transistor on said peripheral circuit, wherein:
said gate line has a laminated structure including a bottom layer metal film and a top layer metal film, and a top electrode of said storage capacitor is a metal film on the same layer as said bottom layer metal film to make up said gate lines. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
Specification