Method For Pattern Formation And Apparatus For Pattern Formation

• US 20080095934A1
• Filed: 12/27/2005
• Published: 04/24/2008
• Est. Priority Date: 12/28/2004
• Status: Active Grant

• Current Assignee: Grapac Japan Co., Inc.
• Original Assignee: Grapac Japan Co., Inc.
• Inventors: Yumoto, Yoshihide
• Granted Patent: US 7,776,402 B2
• Time in Patent Office: Days
• US Class Current: 427/162
• CPC Class Codes: B05D 1/02 performed by spraying
• CPC Class Codes: B29C 59/00 Surface shaping of articles, e.g. embossing; Apparatus therefor in-mould printing B29C37/0025; by using liquids B29C71/0009; by using gases without chemical reaction B29C71/009; for decorating in general B44; abrasive blasting B24C; chemical aspects C08J7/00
• CPC Class Codes: B29D 11/00365 Production of microlenses lenticular sheets B29D11/00278
• CPC Class Codes: G02B 27/60 Systems using moiré fringes
• CPC Class Codes: G02B 3/0012 characterised by the manufacturing method
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G02B 30/27 involving lenticular arrays
• CPC Class Codes: G02F 1/133354 Arrangements for aligning or assembling substrates
• CPC Class Codes: H01J 9/242 Spacers between faceplate and backplate
• CPC Class Codes: H01L 27/14625 Optical elements or arrangements associated with the device
• CPC Class Codes: H01L 27/14627 Microlenses
• CPC Class Codes: H01L 27/14685 Process for coatings or optical elements

Abstract

The present invention relates to a method for pattern formation and an apparatus for pattern formation, the method comprising: applying, between partition lines for pattern formation formed on a surface of a base member, a resin composition for pattern formation having small compatibility or substantially no compatibility with a resin forming the partition lines for pattern formation, in a state in which the surface of the base member with the partition lines for pattern formation formed whereon is placed face down; maintaining the state in which the resin composition for pattern formation is held on the surface of the base member that is placed face down in order to form the resin composition for pattern formation applied between the partition lines for pattern formation into a downward convex shape; and curing the resin composition for pattern formation that is formed into the downward convex shape in order to form a pattern.

Claims

1. A method for pattern formation comprising:

applying, between partition lines for pattern formation formed on a surface of a base member, a resin composition for pattern formation having a small compatibility or substantially no compatibility with a resin forming the partition lines for pattern formation, in a state in which the surface of the base member with the partition lines for pattern formation formed thereon is placed face down;

maintaining the state in which the resin composition for pattern formation is held on the surface of the base member that is placed face down in order to form the resin composition for pattern formation applied between the partition lines for pattern formation into a downward convex shape; and

curing the resin composition for pattern formation that is formed into the downward convex shape in order to form a pattern.

3. The method for pattern formation according to claim 1 or 2, wherein the pattern is a convex lens.

6. The method for pattern formation according to claim 1, wherein the surface of the base member has an arithmetic mean roughness value (Ra value) of 0.001 through 5, and a maximum height value (Ry value) of 0.001 to 28, the Ra value and the Ry value being defined by JIS B 0601.

7. The method for pattern formation according to claim 1, wherein the resin composition for pattern formation has a refractivity of 1.35 to 1.75.

8. The method for pattern formation according to claim 1, wherein the resin composition for pattern formation comprises 50 to 95 wt % of a polymerizable substance, 0 to 5 wt % of a contraction inhibitor and 1 to 15 wt % of a polymerization initiator.

9. The method for pattern formation according to claim 6, wherein the resin forming the partition lines for pattern formation is applied to the surface of the base member by printing.

2. A method for pattern formation comprising:

forming a first undercoating layer on a surface of a base member and then forming a second undercoating layer on a surface of the first undercoating layer, wherein said second undercoating layer has broken parts at predetermined intervals through which parts of the first undercoating layer are exposed;

applying a resin composition for pattern formation that has a small compatibility or substantially no compatibility with the first undercoating layer but has compatibility with the second undercoating layer, in a state in which the surface of the base member having the first undercoating layer and the second, undercoating layer is placed face down;

maintaining the state in which the resin composition for pattern formation is held on the faced-down second undercoating layer in order to form the resin composition for pattern formation held on the second undercoating layer into a downward convex shape; and

curing the resin composition for pattern formation that is formed into the downward convex shape in order to form a pattern.

4. An apparatus for pattern formation comprising:

a pattern formation resin composition applying section for applying a resin composition for pattern formation to a surface of a base member in a state in which the surface of the base member is placed face down; and

a curing section for forming a pattern by curing the resin composition for pattern formation provided on the base member, which is transferred in a state in which the resin composition for pattern formation having been applied to the down-facing surface of the base member is kept face down and held on the surface of the base member, wherein a top surface printing section that performs printing on an opposite surface of said surface of the base member is not provided.

5. The apparatus for pattern formation according to claim 4, wherein the pattern is a convex lens.

10. The apparatus according to claim 4, further comprising a pattern formation partition line applying section, placed before the pattern formation resin applying section.

11. The apparatus according to claim 10, wherein the pattern formation partition line applying section comprises a conveying roller around which the base member is wound, and a partition line transfer roller placed adjacent to the conveying roller, whereby partition lines are formed on the surface of the base member by the partition line transfer roller while the base member on the conveying roller is being conveyed to the pattern formation resin applying section.

12. The apparatus according to claim 11, wherein the pattern formation resin applying section comprises an impression cylinder for receiving the base member conveyed from the pattern formation partition line applying section and for conveying the base member to the curing section, a blanket cylinder disposed under the impression cylinder for applying the resin composition for pattern formation to the surface of the base member on which the partition lines are formed, and a roller placed in contact with the blanket cylinder for supplying the resin composition for pattern formation to the blanket cylinder, whereby the resin composition for pattern formation is applied to the surface of the base member while the base member is being conveyed to the curing section.

13. An apparatus according to claim 4, further comprising a base member conveying section, placed between the pattern formation resin applying section and the curing section, for receiving the base member conveyed from the pattern formation resin applying section and conveying the base member to the curing section with the surface to which the resin composition for pattern formation is applied being held face down.

14. An apparatus according to claim 10, further comprising a base member conveying section, placed between the pattern formation resin applying section and the curing section, for receiving the base member conveyed from the pattern formation resin applying section and conveying the base member to the curing section with the surface coated with the resin composition for pattern formation being held face down.

15. An apparatus according to claim 12, further comprising a base member conveying section, placed between the pattern formation resin applying section and the curing section, for receiving the base member conveyed from the pattern formation resin applying section and conveying the base member to the curing section, wherein the base member conveying section comprises a first conveying cylinder on which the base member is wound so that the surface coated with the resin composition for pattern formation faces a peripheral surface of the first conveying cylinder, yet the applied resin for pattern formation is prevented from contacting the peripheral surface.

16. The apparatus according to claim 4, wherein the curing section comprises a second conveying cylinder for receiving the base member sent from the pattern formation resin applying section, and a light irradiator, placed below the second conveying cylinder, for irradiating the resin composition with a light to cure the resin composition, wherein the base member is wound around the second conveying cylinder so that the surface coated with the resin composition is exposed to the light.

17. The apparatus according to claim 12, wherein the curing section comprises a second conveying cylinder for receiving the base member sent from the pattern formation resin applying section, and a light irradiator, placed below the second conveying cylinder, for irradiating the resin composition with a light to cure the resin composition, wherein the base member is wound around the second conveying cylinder so that the surface coated with the resin composition is exposed to the light.

18. The apparatus according to claim 15, wherein the curing section comprises a second conveying cylinder for receiving the base member sent from the first conveying cylinder, and a light irradiator, placed below the second conveying cylinder, for irradiating the resin composition with a light to cure the resin composition, wherein the base member is wound around the second conveying cylinder so that the surface coated with the resin composition is exposed to the light.