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Multilayer Coatings By Plasma Enhanced Chemical Vapor Deposition

  • US 20080095954A1
  • Filed: 09/02/2005
  • Published: 04/24/2008
  • Est. Priority Date: 09/27/2004
  • Status: Abandoned Application
First Claim
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1. A process for preparing a multiple layer coating on the surface of an organic polymeric substrate by means of atmospheric pressure plasma deposition, the steps of the process comprising depositing a layer (first layer) of a plasma polymerized, optically clear, highly adherent, organosilicon compound onto the surface of the organic polymeric substrate by atmospheric pressure plasma deposition of a gaseous mixture comprising a tetraalkylorthosilicate compound and optionally an oxidant in a first step and thereafter in a second step depositing a substantially uniform layer (second layer) of a silicon oxide compound onto the exposed surface of said first layer by atmospheric pressure plasma deposition of a gaseous mixture comprising an oxidant and a tetraalkylorthosilicate compound, wherein the molar ratio of oxidant to tetraalkylorthosilicate compound in the gaseous mixture used is greater in the second step than in the first step.

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