Immersion lithography system and method having a wafer chuck made of a porous material

• US 20080100812A1
• Filed: 10/10/2007
• Published: 05/01/2008
• Est. Priority Date: 10/26/2006
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Coon, Derek, Poon, Alex Ka Tim, Kho, Leonard Wai Fung, Keswani, Gaurav
• Application Number:
  US11/907,218
• Publication Number:
  US 20080100812A1
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details

Abstract

An immersion lithography apparatus having a substrate chuck made of a porous material. The porous substrate chuck is provided to contact and support the back surface of the substrate and hold the substrate in place. The porous substrate chuck facilitates in the removal of any immersion liquid under the substrate.

Claims

1. An apparatus, comprising:

a projection optical system having a last optical element, the projection optical system projecting an image onto a target area on a front surface of a substrate through an immersion liquid filled in a gap between the front surface of the substrate and the last optical element; and

a porous chuck that contacts a back surface of the substrate and holds the substrate in place, the porous substrate chuck facilitating the removal of the immersion liquid that may flow in a space adjacent to the back surface of the substrate.

2. The apparatus of claim 1, further comprising a vacuum system fluidly coupled to the porous chuck, the vacuum system pulling the immersion liquid that may flow in the space adjacent to the back surface of the substrate through the pores of the porous chuck.

3. The apparatus of claim 2, wherein the vacuum system is fluidly coupled to the porous chuck at one or more vacuum ports.

4. The apparatus of claim 1, wherein the porous chuck consists of one of the following materials:

ceramic, metal, or glass.

5. The apparatus of claim 1, wherein the porous chuck further comprises a plurality of pores, the pores having a size ranging from 0.1 to 5 microns.

6. The apparatus of claim 1, wherein the porous chuck is has a size ranging from:

300 to 500 millimeters.

7. The apparatus of claim 1, wherein the porous chuck has a thickness ranging from 10 to 50 millimeters.

8. The apparatus of claim 1, wherein the porous chuck is mounted onto a stage using one of the following:

magnets, a vacuum, mechanical fasteners, or a combination thereof.

9. The apparatus of claim 1, wherein the porous chuck is mounted onto a fine stage, the fine stage capable of moving the substrate held by the porous chuck from one to six degrees of freedom.

10. The apparatus of claim 9, wherein the fine stage is mounted onto a coarse stage, the coarse stage capable of moving the fine stage from one to six degrees to freedom.

11. The apparatus of claim 10, wherein the fine stage is supported on the coarse stage using one of the following:

magnetic levitation, air bellows, pistons, vacuum, springs, or a combination thereof.

12. The apparatus of claim 9, wherein the fine stage is capable of moving the substrate held by the porous chuck in one of the following motions:

(i) a step-and-repeat motion;

or

(ii) a scanning motion.

13. The apparatus of claim 1, further comprising:

a liquid confinement member that substantially surrounds the gap, the liquid confinement member including one or more liquid inlets to introduce the immersion liquid into the gap and one or more porous elements for removal of the immersion liquid from the gap.

14. The apparatus of claim 13, further comprising a vacuum system fluidly connected to the one or more porous elements of the liquid confinement member, the vacuum system providing a pressure on a surface of the one or more porous elements, the pressure being controlled at or below the bubble point of the one or more porous elements to remove the immersion liquid from the gap without any gas.

15. The apparatus of claim 1, further comprising:

a liquid confinement member that is sufficiently large to submerge at least the target exposure area of the substrate in the immersion liquid.

16. The apparatus of claim 1, further comprising:

a liquid confinement member that is sufficiently large to submerge the entire front surface of the substrate in the immersion liquid.

17. The apparatus of claim 1, further comprising:

an immersion element that forms a gas curtain with one or more gas inlets, the gas curtain being formed so as to surround the gap between the front surface of the substrate and the last optical element.

18. The apparatus of claim 17, wherein the immersion element further comprises one or more vacuum ports, positioned adjacent the one or more gas inlets.

37. The apparatus of claim 1, wherein the porous chuck provides a dry surface for chucking the substrate by facilitating the removal of the immersion liquid that may collect between the back surface of the substrate and the porous substrate chuck.

38. The apparatus of claim 1, wherein the porous substrate chuck further comprises a plurality of pins.

19. A method, comprising:

providing a substrate having a front surface and a back surface on a porous chuck so that the back surface of the substrate contacts and is held by the porous chuck;

projecting an image onto a target area on the front surface of the substrate through an immersion liquid filled in a gap between the front surface of the substrate and a last optical element of a projection optical system; and

removing at least a portion of the immersion liquid through the porous chuck.

20. The method of claim 19, further comprising

fluidly connecting a vacuum system to the porous chuck to remove the immersion liquid through the pores of the porous chuck.

21. The method of claim 20, wherein the vacuum system is fluidly coupled to the porous chuck at one or more vacuum ports.

22. The method of claim 19, wherein the porous chuck consists of one of the following materials:

ceramic, metal, or glass.

23. The method of claim 19, wherein the porous chuck further comprises a plurality of pores, the pores having a size ranging from 0.1 to 5 microns.

24. The method of claim 19, wherein the porous chuck has a size ranging from 300 to 500 microns.

25. The method of claim 19, wherein the porous chuck has a thickness ranging from 10 to 50 millimeters.

26. The method of claim 19, wherein the porous chuck is mounted onto a stage using one of the following:

magnets, a vacuum, mechanical fasteners, or a combination thereof.

27. The method of claim 19, wherein the porous chuck is mounted on a fine stage, the fine stage capable of moving the substrate held by the porous chuck from one to six degrees of freedom.

28. The method of claim 27, wherein the fine stage is mounted on a coarse stage, the coarse stage capable of moving the fine stage from one to six degrees to freedom.

29. The method of claim 28, wherein the fine stage is supported on the coarse stage using one of the following:

magnetic levitation, air bellows, pistons, vacuum, springs, or a combination thereof.

30. The method of claim 27, wherein the fine stage is capable of moving the substrate held by the porous chuck in one of the following motions:

(i) a step-and-repeat motion;

or

(ii) a scanning motion.

31. The method of claim 19, further comprising:

introducing the immersion liquid into the gap through one or more liquid inlets; and

removing the introduced immersion liquid through one or more porous element from the gap.

32. The method of claim 31, further comprising:

fluidly connecting a vacuum system to the one or more porous element to remove the immersion liquid from the gap, the vacuum applying a pressure on a surface of the one or more porous elements, the pressure being controlled at or below the bubble point of the one or more porous elements to remove the immersion liquid without any gas.

33. The method of claim 19, wherein at least the target area of the substrate is submerged in the immersion liquid while the image is projected to the target area.

34. The method of claim 19, wherein the entire front surface of the substrate is immersed in the immersion liquid while the image is projected to the target area.

35. The method of claim 19, further comprising:

forming a gas curtain so as to surround the gap between the last optical element and the front surface of the substrate.

36. The method of claim 35, wherein the gas curtain is formed using one or more gas inlets and one or more vacuum ports, positioned adjacent the one or more gas inlets.

39. The method of claim 19, wherein the porous substrate chuck provides a dry surface for chucking the substrate by facilitating the removal of the immersion liquid that may collect between the back surface of the substrate and the porous substrate chuck.

40. The method of claim 19, wherein a plurality of pins are provided on the porous substrate chuck.