Immersion lithography system and method having a wafer chuck made of a porous material
First Claim
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1. An apparatus, comprising:
- a projection optical system having a last optical element, the projection optical system projecting an image onto a target area on a front surface of a substrate through an immersion liquid filled in a gap between the front surface of the substrate and the last optical element; and
a porous chuck that contacts a back surface of the substrate and holds the substrate in place, the porous substrate chuck facilitating the removal of the immersion liquid that may flow in a space adjacent to the back surface of the substrate.
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Abstract
An immersion lithography apparatus having a substrate chuck made of a porous material. The porous substrate chuck is provided to contact and support the back surface of the substrate and hold the substrate in place. The porous substrate chuck facilitates in the removal of any immersion liquid under the substrate.
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Citations
40 Claims
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1. An apparatus, comprising:
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a projection optical system having a last optical element, the projection optical system projecting an image onto a target area on a front surface of a substrate through an immersion liquid filled in a gap between the front surface of the substrate and the last optical element; and a porous chuck that contacts a back surface of the substrate and holds the substrate in place, the porous substrate chuck facilitating the removal of the immersion liquid that may flow in a space adjacent to the back surface of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 37, 38)
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19. A method, comprising:
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providing a substrate having a front surface and a back surface on a porous chuck so that the back surface of the substrate contacts and is held by the porous chuck; projecting an image onto a target area on the front surface of the substrate through an immersion liquid filled in a gap between the front surface of the substrate and a last optical element of a projection optical system; and removing at least a portion of the immersion liquid through the porous chuck. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 39, 40)
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Specification