Semiconductor device
First Claim
1. A semiconductor device, comprising:
- a gate stack positioned on a semiconductor substrate, the gate stack including a gate oxide layer positioned on the semiconductor substrate and a metal-containing layer positioned on the gate oxide layer;
a cap layer positioned on the metal-containing layer;
a spacer positioned on the sidewall of the gate stack; and
a passivation layer positioned between the gate stack and the spacer, and the passivation layer being configured to prevent the gate stack from corrosion.
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Abstract
The present gate structure comprises a gate oxide layer positioned on a substrate, a conductive stack positioned on the gate oxide layer, a passivation layer positioned on the sidewall of the conductive stack, and a cap layer positioned on the conductive stack. The conductive stack includes a polysilicon layer, a tungsten nitride layer, and a tungsten layer. The passivation layer can be made of silicon oxide, silicon nitride, or silicon oxynitride. The present method for preparing the gate structure comprises steps of forming a gate oxide layer, a conductive stack, and a cap layer on a semiconductor substrate in sequence, removing a portion of the gate oxide layer, the conductive stack, and the cap layer to form at least one opening, implanting silicon ions into the sidewall of the conductive stack, and performing a thermal treating process to transform the sidewall with silicon ions into a passivation layer.
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Citations
10 Claims
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1. A semiconductor device, comprising:
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a gate stack positioned on a semiconductor substrate, the gate stack including a gate oxide layer positioned on the semiconductor substrate and a metal-containing layer positioned on the gate oxide layer;
a cap layer positioned on the metal-containing layer;
a spacer positioned on the sidewall of the gate stack; and
a passivation layer positioned between the gate stack and the spacer, and the passivation layer being configured to prevent the gate stack from corrosion. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification