Exposure Apparatus and Device Manufacturing Method
First Claim
1. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system to expose the substrate, wherein the projection optical system comprises a first optical element that is closest to an image plane of the projection optical system and a second optical element that is closest to the image plane next to the first optical element, and the exposure apparatus comprises a collection port that is provided at a position higher than a lower surface of the second optical element and that recovers a liquid held in a space between an upper surface of the first optical element and the lower surface of the second optical element.
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Accused Products
Abstract
An exposure apparatus emits exposure light onto a substrate (P) via a projection optical system (PL) to expose the substrate (P). The projection optical system (PL) includes a first optical element (LS1) closest to an image plane of the projection optical system (PL) and a second optical element (LS2) closest to the image plane next to the first optical element (LS1). The exposure apparatus is disposed alia position higher than a lower surface (T3) of the second optical element (LS2) and includes a second collection port (42) that recovers a second liquid (LQ2) held in a second space (K2) between an upper surface (T2) of the first optical element (LS1) and the lower surface (T3) of the second optical element (LS2).
37 Citations
36 Claims
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1. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system to expose the substrate, wherein
the projection optical system comprises a first optical element that is closest to an image plane of the projection optical system and a second optical element that is closest to the image plane next to the first optical element, and the exposure apparatus comprises a collection port that is provided at a position higher than a lower surface of the second optical element and that recovers a liquid held in a space between an upper surface of the first optical element and the lower surface of the second optical element.
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15. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system to expose the substrate, wherein
the projection optical system comprises a first optical element that is closest to an image plane of the projection optical system and a second optical element that is closest to the image plane next to the first optical element, the exposure apparatus comprises a nozzle member that is disposed in an annular shape so as to enclose the second optical element and that has at least one of a liquid supply outlet and a liquid collection port that forms an immersion region of liquid between the first optical element and the second optical element, and the nozzle member comprises a holding portion that holds the first optical element by vacuum attraction.
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16. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system to expose the substrate, wherein
the projection optical system comprises a first optical element that is closest to an image plane of the projection optical system and a second optical element that is closest to the image plane next to the first optical element, and the exposure apparatus comprises an immersion mechanism that forms an immersion region of a liquid in a space between the first optical element and the second optical element; - and
a detector that detects whether the liquid has leaked from the space. - View Dependent Claims (17)
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18. An exposure apparatus for emitting exposure light onto a substrate via a projection optical system to expose the substrate, comprising:
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an immersion mechanism that forms an immersion region of a liquid on an upper surface of a predetermined optical element from among a plurality of optical elements constituting the projection optical system, a supporting member that holds the predetermined optical element; and
a discharge outlet that is provided at the support member and that discharges the liquid from the immersion region. - View Dependent Claims (19, 20, 21, 22, 23)
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24. An exposure apparatus for emitting exposure light onto a substrate via a first optical element to expose the substrate, comprising:
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a supply outlet that supplies a liquid to an upper surface side of the first optical element such that a predetermined region on the upper surface of the first optical element forms an immersion region, the exposure light passing through the predetermined region; and
a frame member that has a support portion that supports an outer circumferential portion of the first optical element and encloses the first optical element, wherein the liquid supplied to the upper surface side of the first optical element is discharged from between the first optical element and the frame member. - View Dependent Claims (25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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Specification