METHOD AND DEVICE FOR SELECTIVE ADJUSTMENT OF HYSTERESIS WINDOW
First Claim
1. A method of manufacturing an interferometric display element, wherein the interferometric display element comprises a moveable reflective layer, a partially reflective layer, and a dielectric layer positioned between the moveable reflective layer and the partially reflective layer, the moveable reflective layer being suspended away from the partially reflective layer by one or more supports so as to define a cavity between the moveable reflective layer and the dielectric layer, the method comprising:
- selecting one or more characteristics of at least one of a support thickness, a support width, a dielectric layer thickness, and a moveable layer width, wherein the selected one or more characteristics define one or more of an actuation threshold, a relax threshold, and a voltage difference between the actuation and relax thresholds of the interferometric display element;
optimizing the one or more characteristics for at least one of low power consumption, speed, and ease of manufacturing of the interferometric display element; and
manufacturing the interferometric display element to include the selected one or more characteristic.
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Accused Products
Abstract
The width and location of a hysteresis window of an interferometric modulator may be altered by adjusting various physical characteristics of the interferometric modulator. Thus, depending on the particular application for which the interferometric modulators are manufactured, the width and location of the hysteresis window may be altered. For example, in some applications, reducing the power required to operate an array of interferometric modulators may be an important consideration. In other applications, the speed of the interferometric modulators may be of more importance, where the speed of an interferometric modulator, as used herein, refers to the speed of actuating and relaxing the moveable mirror. In other applications, the cost and ease of manufacturing may be of most importance. Systems and methods are introduced that allow selection of a width and location of a hysteresis window by adjusting various physical characteristics.
23 Citations
21 Claims
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1. A method of manufacturing an interferometric display element, wherein the interferometric display element comprises a moveable reflective layer, a partially reflective layer, and a dielectric layer positioned between the moveable reflective layer and the partially reflective layer, the moveable reflective layer being suspended away from the partially reflective layer by one or more supports so as to define a cavity between the moveable reflective layer and the dielectric layer, the method comprising:
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selecting one or more characteristics of at least one of a support thickness, a support width, a dielectric layer thickness, and a moveable layer width, wherein the selected one or more characteristics define one or more of an actuation threshold, a relax threshold, and a voltage difference between the actuation and relax thresholds of the interferometric display element;
optimizing the one or more characteristics for at least one of low power consumption, speed, and ease of manufacturing of the interferometric display element; and
manufacturing the interferometric display element to include the selected one or more characteristic. - View Dependent Claims (2)
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3. A method of manufacturing an interferometric display element, wherein the interferometric display element comprises a moveable reflective layer, a partially reflective layer, and a dielectric layer positioned between the moveable reflective layer and the partially reflective layer, the moveable reflective layer being suspended away from the partially reflective layer by one or more supports so as to define a cavity between the moveable reflective layer and the dielectric layer, the method comprising:
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selecting one or more characteristics of at least one of a moveable layer thickness, a moveable layer width, a moveable layer material, and a moveable layer stress level, wherein the selected one or more characteristics define one or more of an actuation threshold, a relax threshold, and a voltage difference between the actuation and relax thresholds of the interferometric display element;
optimizing the one or more characteristics for at least one of low power consumption, speed, and ease of manufacturing of the interferometric display element; and
manufacturing the interferometric display element to include the selected one or more characteristic. - View Dependent Claims (4)
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5. An interferometric modulator optimized for at least one of (a) low power consumption, (b) speed, and (c) ease of manufacturing, comprising:
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means for reflecting light; and
means for selectively moving the means for reflecting light with respect to a partially reflective layer, said means for selectively moving having one or more characteristics selected to define an expected relax threshold and an expected actuation threshold of the interferometric modulator. - View Dependent Claims (6, 7, 8)
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9. An interferometric modulator comprising:
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a moveable reflective layer;
an optical stack comprising a partially reflective layer and an electrically conductive layer;
a dielectric material positioned between the moveable reflective layer and the partially reflective layer; and
one or more supports positioned between the moveable reflective layer and the dielectric material and configured to define a gap between the moveable reflective layer and the dielectric layer, wherein one or more characteristics of the moveable layer, partially reflective layer, electrically conductive layer, dielectric material, and one or more supports are selected to define an expected relax threshold and an expected actuation threshold of the interferometric modulator. - View Dependent Claims (10)
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11. A display element comprising:
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a reflective moveable layer;
an optical stack comprising a partially reflective layer and an electrically conductive layer, wherein the electrically conductive layer is patterned so that a total surface area of the electrically conductive layer surface that is adjacent to the reflective moveable layer is reduced when compared to a continuous electrically conductive layer; and
a dielectric material positioned between the reflective moveable layer and the partially reflective layer; and
supports positioned between the reflective moveable layer and the dielectric material and configured to define a gap between the reflective moveable layer and the partially reflective layer. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of manufacturing an interferometric modulator to incorporate a selected actuation threshold, the method comprising:
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selecting an area of an electrically conductive layer to be used in the interferometric modulator to be electrically isolated, wherein a characteristic of the electrically isolated area defines an expected actuation threshold of the interferometric modulator; and
manufacturing the interferometric modulator by use of the selected electrically isolated area such that the actuation threshold of the manufactured interferometric modulator is substantially equal to the expected actuation threshold.
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Specification