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Substrate Holding Apparatus, Exposure Apparatus, and Device Fabrication Method

  • US 20080111984A1
  • Filed: 12/14/2005
  • Published: 05/15/2008
  • Est. Priority Date: 12/15/2004
  • Status: Active Grant
First Claim
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1. A substrate holding apparatus that holds a substrate to be processed whereto a liquid is supplied, comprising:

  • a base;

    a first support part, which is formed on the base and supports a rear surface of the substrate to be processed;

    a first circumferential wall part, which is formed on the base and is provided so that it opposes the rear surface of the substrate to be processed and surrounds the first support part; and

    a first recovery port, which is provided on the outer side of the first circumferential wall part, wherein,the flow of a gas along the first circumferential wall part moves the liquid on the outer side of the first circumferential wall part to the first recovery port, where the liquid is recovered.

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