Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
a substrate table constructed to hold a substrate;
a projection system configured to project the patterned radiation beam onto a target portion of the substrate, andan applicator to apply molecules onto a clamp area of the patterning device.
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Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to a clamp area of the patterning device.
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Citations
16 Claims
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1. A lithographic apparatus comprising:
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an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and an applicator to apply molecules onto a clamp area of the patterning device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for holding a patterning device in a lithographic apparatus, the method comprising:
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applying molecules onto a clamp area of the patterning device; and clamping the clamp area of the patterning device to a support of the lithographic apparatus, the support being constructed to support the patterning device.
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14. A device manufacturing method comprising:
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supporting a patterning device using a support, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam; projecting the patterned radiation beam onto a substrate, developing the substrate; manufacturing a device from the developed substrate, and applying molecules onto a clamp area of the patterning device before being supported by the support.
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15. A device manufacturing method comprising:
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conditioning a beam of radiation; applying molecules onto a clamp area of a patterning device, the patterning device capable of imparting the beam of radiation with a pattern in its cross-section to form a patterned radiation beam; clamping the patterning device on a support, and projecting the patterned radiation beam onto a substrate. - View Dependent Claims (16)
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Specification