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Lithographic apparatus and device manufacturing method

  • US 20080117391A1
  • Filed: 11/16/2006
  • Published: 05/22/2008
  • Est. Priority Date: 11/16/2006
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system configured to condition a radiation beam;

    a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

    a substrate table constructed to hold a substrate;

    a projection system configured to project the patterned radiation beam onto a target portion of the substrate, andan applicator to apply molecules onto a clamp area of the patterning device.

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