Lithographic apparatus and device manufacturing method

• US 20080117391A1
• Filed: 11/16/2006
• Published: 05/22/2008
• Est. Priority Date: 11/16/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bijvoet, Dirk-Jan, Onvlee, Johannes
• Granted Patent: US 7,933,000 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details

Abstract

A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to a clamp area of the patterning device.

Claims

1. A lithographic apparatus comprising:

an illumination system configured to condition a radiation beam;

a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;

a substrate table constructed to hold a substrate;

a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and

an applicator to apply molecules onto a clamp area of the patterning device.

2. The lithographic apparatus according to claim 1, wherein the applicator comprises a humidifier to humidify the clamp area of the patterning device.

3. The lithographic apparatus according to claim 2, wherein the humidifier is comprised in the support.

4. The lithographic apparatus according to claim 3, wherein the humidifier comprises an outlet in a clamp area of the support to guide a gas comprising a water vapor to the clamp area of the patterning device.

5. The lithographic apparatus according to claim 4, wherein the humidifier further comprises a discharge inlet to guide away at least a part of the gas provided by the outlet.

6. The lithographic apparatus according to claim 5, wherein the humidifier is constructed such that an amount of gas provided by the outlet is at least equal to an amount or gas guided away by the discharge inlet.

7. The lithographic apparatus according to claim 5, wherein the clamp of the support comprises a vacuum clamp, the discharge inlet being a vacuum suction inlet of the clamp.

8. The lithographic apparatus according to claim 5, wherein the clamp of the support comprises a vacuum clamp, the support including a recess to form a vacuum chamber of the vacuum clamp when holding the patterning device, the humidifier to provide via the outlet a quantity of the gas to substantially fill the vacuum chamber when the patterning device is transported to the support.

9. The lithographic apparatus according to claim 2, wherein the humidifier is comprised in a storage device of the lithographic apparatus, the storage device to store the patterning device before being transported to the support.

10. The lithographic apparatus according to claim 2, wherein the humidifier is comprised in a patterning device handling robot, the patterning device robot to transport the patterning device from the storage device to the support.

11. The lithographic apparatus according to claim 2, further comprising a conditioner configured to condition at least a space adjoining a surface of the patterning device when the patterning device is irradiated by the radiation beam, the conditioner to provide a substantially humid free environment in the space.

12. The lithographic apparatus according to claim 2, further comprising a storage device conditioner to condition at least a space in a storage device adapted to store the patterning device, the space adjoining a surface of the patterning device when stored in the storage device, the surface of the patterning device to be irradiated by the radiation beam.

13. A method for holding a patterning device in a lithographic apparatus, the method comprising:

applying molecules onto a clamp area of the patterning device; and

clamping the clamp area of the patterning device to a support of the lithographic apparatus, the support being constructed to support the patterning device.

14. A device manufacturing method comprising:

supporting a patterning device using a support, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;

projecting the patterned radiation beam onto a substrate,

developing the substrate;

manufacturing a device from the developed substrate, and

applying molecules onto a clamp area of the patterning device before being supported by the support.

15. A device manufacturing method comprising:

conditioning a beam of radiation;

applying molecules onto a clamp area of a patterning device, the patterning device capable of imparting the beam of radiation with a pattern in its cross-section to form a patterned radiation beam;

clamping the patterning device on a support, and

projecting the patterned radiation beam onto a substrate.

16. The method according to claim 15, further comprising conditioning at least a space adjoining a surface of the patterning device when the patterning device is irradiated by the beam of radiation, the conditioner to provide a substantially humid free environment in the space.