DUAL TOP GAS FEED THROUGH DISTRIBUTOR FOR HIGH DENSITY PLASMA CHAMBER
First Claim
Patent Images
1. A gas distributor for use in a semiconductor process chamber, the gas distributor comprising:
- a body including,a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening,a second channel formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening; and
wherein the first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
1 Assignment
0 Petitions
Accused Products
Abstract
A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
-
Citations
19 Claims
-
1. A gas distributor for use in a semiconductor process chamber, the gas distributor comprising:
-
a body including, a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening, a second channel formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening; and wherein the first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A gas distributor for use in a semiconductor process chamber, the gas distributor comprising:
-
a body including, a lower surface, a plurality of first openings disposed on the lower surface and adapted to pass a first fluid from a fluid first supply line to the chamber, a second opening disposed on the lower surface and adapted to pass a second fluid from a second gas supply line to the chamber; and wherein the plurality of first openings are disposed around the second opening and arranged to mix the fluids outside the body after the fluids pass through the openings. - View Dependent Claims (9, 10, 11, 12)
-
-
13. A method of depositing a thin film in a semiconductor process chamber, the method comprising:
-
passing a first fluid through a first channel disposed within a body of a gas distributor; passing a second fluid through a second channel disposed within the body of the gas distributor, wherein the first fluid remains separated from the second fluid while the fluids pass through the channels; and expelling the fluids from the channels to mix the first fluid with the second fluid outside the gas distributor wherein the first fluid undergoes a chemical reaction with the second fluid outside the gas distributor. - View Dependent Claims (14, 15, 16)
-
-
17. A device for use with a semiconductor process to deposit a layer on a semiconductor wafer, the device comprising:
-
a top dome and a side wall positioned to define a chamber; a support adapted to support the semiconductor wafer; a gas distributor comprising a body that extends downward into the chamber centrally near the top dome, the body comprising a first channel formed therein and adapted to pass a first fluid downward to a first opening into the chamber, the body comprising a second channel formed therein and adapted to pass a second fluid downward through the gas distributor to a second opening into the chamber; a first fluid supply line coupled to the first channel formed in the body of gas distributor; a second fluid supply line coupled to the second channel formed in the body of the gas distributor to separate the second fluid from the first fluid while the fluids are passed from the supply lines to the openings; and wherein the openings are adapted to mix the first fluid with the second fluid outside the body of the gas distributor. - View Dependent Claims (18, 19)
-
Specification