DYNAMIC SURFACE ANNEALING USING ADDRESSABLE LASER ARRAY WITH PYROMETRY FEEDBACK
First Claim
1. Apparatus for thermal processing a workpiece, comprising:
- a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each said laser being individual adjustable;
optics for focusing the radiation from said array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby said optics images respective columns of said laser array onto respective sections of said narrow line beam;
a pyrometer sensor sensitive to a pyrometer wavelength;
an optical element in an optical path of said optics and tuned to divert radiation emanating from said workpiece plane to said pyrometry sensor, whereby said optics images each said respective section of said narrow line beam onto a corresponding portion of said pyrometer sensor; and
a controller responsive to said pyrometry sensor and coupled to adjust individual optical outputs of respective columns of said laser array in accordance with outputs of corresponding portions of said pyrometry sensor.
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Accused Products
Abstract
Apparatus for dynamic surface annealing of a semiconductor wafer includes a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each the laser being individual adjustable and optics for focusing the radiation from the array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby the optics images respective columns of the laser array onto respective sections of the narrow line beam. A pyrometer sensor is provided that is sensitive to a pyrometer wavelength. An optical element in an optical path of the optics is tuned to divert radiation emanating from the workpiece plane to the pyrometry sensor. As a result, the optics images each of the respective section of the narrow line beam onto a corresponding portion of the pyrometer sensor. The apparatus further includes a controller responsive to the pyrometry sensor and coupled to adjust individual optical outputs of respective columns of the laser array in accordance with outputs of corresponding portions of the pyrometry sensor.
339 Citations
12 Claims
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1. Apparatus for thermal processing a workpiece, comprising:
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a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of each said laser being individual adjustable; optics for focusing the radiation from said array of lasers into a narrow line beam in a workpiece plane corresponding to a workpiece surface, whereby said optics images respective columns of said laser array onto respective sections of said narrow line beam; a pyrometer sensor sensitive to a pyrometer wavelength; an optical element in an optical path of said optics and tuned to divert radiation emanating from said workpiece plane to said pyrometry sensor, whereby said optics images each said respective section of said narrow line beam onto a corresponding portion of said pyrometer sensor; and a controller responsive to said pyrometry sensor and coupled to adjust individual optical outputs of respective columns of said laser array in accordance with outputs of corresponding portions of said pyrometry sensor. - View Dependent Claims (2, 3, 4, 5, 6)
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7. Apparatus for thermal processing a workpiece, comprising:
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a source of laser radiation emitting at a laser wavelength and comprising an array of lasers arranged in rows and columns, the optical power of at least each column of said laser array being individual adjustable; a pyrometer sensor sensitive to a pyrometer wavelength; common optics projecting in a first direction therethrough a line beam of said laser radiation onto a workpiece plane and directing in an opposed second direction therethrough thermal radiation from said workpiece to said pyrometry sensor as a pyrometry image corresponding to said line beam; and a controller responsive to said pyrometry sensor and coupled to adjust individual optical outputs of respective columns of said laser array in accordance with corresponding portions of said pyrometry image. - View Dependent Claims (8, 9, 10, 11, 12)
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Specification