×

Apparatus and method for monitoring hazardous materials in a processing or other environment

  • US 20080122641A1
  • Filed: 11/29/2006
  • Published: 05/29/2008
  • Est. Priority Date: 11/29/2006
  • Status: Active Grant
First Claim
Patent Images

1. An apparatus, comprising:

  • a sensor operable to detect one or more hazardous materials;

    a tracking system operable to at least one of;

    identify a location of the apparatus and initiate transmission of a signal for identifying the location of the apparatus; and

    an interface operable to transmit data from the sensor, the data associated with the detection of the one or more hazardous materials.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×