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METHOD OF FORMING RU FILM AND METAL WIRING STRUCTURE

  • US 20080124484A1
  • Filed: 11/08/2006
  • Published: 05/29/2008
  • Est. Priority Date: 11/08/2006
  • Status: Abandoned Application
First Claim
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1. A method of depositing a ruthenium (Ru) thin film on a substrate, comprising:

  • (i) treating a surface of the substrate with a metal-organic precursor;

    (ii) adsorbing a ruthenium precursor onto the treated surface of the substrate;

    (iii) treating the adsorbed ruthenium precursor with an excited reducing gas;

    and(iv) repeating steps (ii) and (iii), thereby forming a ruthenium thin film on the substrate.

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