ELECTROCHEMICAL GAS SENSOR CHIP AND METHOD OF MANUFACTURING THE SAME

• US 20080128285A1
• Filed: 11/21/2007
• Published: 06/05/2008
• Est. Priority Date: 12/04/2006
• Status: Abandoned Application

• Current Assignee: Electronics and Telecommunications Research Institute, Senko Company Limited (SENKO Group Holdings Co., Ltd.)
• Original Assignee: Electronics and Telecommunications Research Institute, Senko Company Limited (SENKO Group Holdings Co., Ltd.)
• Inventors: HA, Seung Chul, MIN, Seok Hong, JUNG, Byung Gil, PARK, Kang Ho, KIM, Jong Dae, MOON, Seung Eon, LEE, Hong Yeol, PARK, Jong Hyurk, KIM, Eun Kyoung
• Application Number:
  US11/944,232
• Publication Number:
  US 20080128285A1
• Time in Patent Office: Days
• US Class Current: 205/80
• CPC Class Codes: G01N 27/4045 for gases other than oxygen

Abstract

An electrochemical gas sensor and a method of manufacturing the same are provided. The electrochemical gas sensor includes: a substrate; an electrode patterned on the substrate; a solid electrolyte layer having proton conductivity formed on the substrate having the patterned electrode; and a hydrophobic microporous membrane formed on the solid electrolyte layer. The gas sensor chip is easily integrated with a driving circuit and uses a solid electrolyte layer, and thus it can be manufactured in a smaller size and in a large area process.

Claims

1. An electrochemical gas sensor chip, comprising:

a substrate;

an electrode patterned on the substrate;

a solid electrolyte layer having proton conductivity formed on the substrate having the patterned electrode; and

a hydrophobic microporous membrane formed on the solid electrolyte layer.

2. The electrochemical gas sensor chip according to claim 1, wherein the substrate is formed of one selected from the group consisting of silicon, polycarbonate, quartz, GaAs, InP and glass.

3. The electrochemical gas sensor chip according to claim 1, wherein the patterned electrode is configured such that a working electrode, a counter electrode and a reference electrode are formed on the same surface of the substrate.

4. The electrochemical gas sensor chip according to claim 1, wherein the patterned electrode is configured such that a counter electrode and a reference electrode are formed on the same surface of the substrate, and a working electrode is formed on the solid electrolyte layer.

5. The electrochemical gas sensor chip according to claim 4, wherein the reference electrode is connected with the counter electrode.

6. The electrochemical gas sensor chip according to claim 3, wherein the reference electrode is connected with the counter electrode.

7. The electrochemical gas sensor chip according to claim 1, wherein the electrode is formed of one selected from the group consisting of silver, gold, platinum, rhodium, iridium, ruthenium, palladium and conductive oxide.

8. The electrochemical gas sensor chip according to claim 1, wherein the solid electrolyte layer having proton conductivity is a Nafion®

layer.

9. The electrochemical gas sensor chip according to claim 1, wherein the hydrophobic microporous membrane has micropores through which gas passes but ions or moisture cannot pass.

10. A method of manufacturing an electrochemical gas sensor chip, comprising the steps of:

preparing a substrate;

patterning an electrode on the substrate;

forming a solid electrolyte layer having proton conductivity on the substrate having the patterned electrode; and

forming a hydrophobic microporous membrane on the solid electrolyte layer.

11. The method according to claim 10, wherein the electrode is formed by sputtering, vacuum deposition or chemical vapor deposition.

12. The method according to claim 10, wherein the solid electrolyte layer is formed by a wet process.

13. The method according to claim 10, wherein the patterned electrode is configured such that a working electrode, a counter electrode and a reference electrode are formed on the same surface of the substrate.

14. The method according to claim 10, wherein the patterned electrode is configured such that a counter electrode and a reference electrode are formed on the same surface of the substrate, and a working electrode is formed on the solid electrolyte layer.