Lithographic apparatus and device manufacturing method

• US 20080129973A1
• Filed: 12/01/2006
• Published: 06/05/2008
• Est. Priority Date: 12/01/2006
• Status: Active Grant

• Current Assignee: ASML Holding NV
• Original Assignee: ASML Holding NV
• Inventors: Sewell, Harry, Markoya, Louis John, McCafferty, Diane
• Granted Patent: US 7,684,014 B2
• Time in Patent Office: Days
• US Class Current: 355/67
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

A lithographic apparatus is presented. The lithographic apparatus includes a beam splitter configured to split a radiation beam into a plurality of radiation beams; a substrate stage configured to support a substrate; a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.

Claims

1. A lithographic apparatus comprising:

a beam splitter configured to split a radiation beam into a plurality of radiation beams;

a substrate stage configured to support a substrate;

a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on the substrate; and

a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is output by the radiation source.

2. The apparatus of claim 1, wherein the control unit is configured to synchronize the motion of the substrate stage with the repetition rate of the radiation source such that the substrate stage moves over an integral number of pitches of the interference pattern between two consecutive beams of radiation outputted by the radiation source.

3. The apparatus of claim 1, wherein the control unit is configured to synchronize the motion of the substrate stage with the repetition rate of the radiation source such that the interference patterns produced by two consecutive beams of radiation are substantially perfectly superimposed.

4. The apparatus of claim 1, wherein the beam splitter is a diffraction grating.

5. The apparatus of claim 4, wherein the diffraction grating is an alternating phase shift grating or a binary grating.

6. The apparatus of claim 4, wherein the diffraction grating is a one dimensional or a two dimensional grating.

7. The apparatus of claim 1, wherein the beam combiner includes a multi-faceted prism.

8. The apparatus of claim 1, wherein the portion of the plurality of radiation beams includes between 2 and 8 beams.

9. The apparatus of claim 1, further comprising a liquid supply system arranged to provide liquid between a surface of the beam combiner and the surface of the substrate.

10. The apparatus of claim 1, wherein the beam combiner includes a plurality of independently moveable mirrors.

11. The apparatus of claim 1, wherein the repetition rate of the radiation source is in a range between 100 Hz and 10,000 Hz.

12. The apparatus of claim 1, wherein the control unit is configured to synchronize the motion of the substrate stage with a repetition rate of the radiation source such that a blur produced on the interference pattern is less than about 3 nm.

13. The apparatus of claim 1, wherein the radiation source is a laser.

14. The apparatus of claim 1, further comprising an optical device configured to select out part of a pulse width of the beam of radiation.

15. A lithographic apparatus comprising:

a diffraction grating configured to create a plurality of radiation beams when the diffraction grating is impinged by a beam of radiation;

a substrate stage configured to support a substrate;

a beam combiner adapted to redirect and combine at least a portion of the plurality of radiation beams to form an interference pattern on a surface of the substrate; and

a control unit in communication with the substrate stage and a radiation source configured to output the beam of radiation, the control unit configured to synchronize a motion of the substrate stage with a repetition rate at which the beam of radiation is outputted by the radiation source such that the substrate stage moves over an integral number of pitches of the interference pattern between two consecutive beams of radiation output by the radiation source.

16. A device manufacturing method comprising:

splitting a beam of radiation so as to form a plurality of radiation beams;

redirecting and combining at least a portion of the plurality of radiation beams onto a substrate so as to form an interference pattern; and

synchronizing a motion of a substrate table configured to support the substrate with a repetition rate at which the beam of radiation is output by a radiation source.

17. The method of claim 16, wherein the synchronizing includes synchronizing the motion of the substrate stage with the repetition rate of the radiation source such that the substrate stage moves over an integral number of pitches of the interference pattern between two consecutive beams of radiation outputted by the radiation source.

18. The method of claim 16, wherein the synchronizing includes synchronizing the motion of the substrate stage with the repetition rate of the radiation source such that the interference patterns produced by two consecutive beams of radiation are substantially perfectly superimposed.

19. The method of claim 16, wherein the beam splitter is an alternating phase shift grating or a binary grating.

20. The method of claim 19, wherein the diffraction grating is a one dimensional or a two dimensional grating.

21. The method of claim 19, wherein the portion of the plurality of radiation beams includes between 2 and 8 beams.

22. The method of claim 16, further comprising selecting out part of a pulse width of the beam of radiation.