METHOD AND APPARATUS FOR FILTER CONDITIONING

• US 20080135498A1
• Filed: 12/11/2006
• Published: 06/12/2008
• Est. Priority Date: 12/11/2006
• Status: Active Grant

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: International Business Machines Corporation
• Inventors: Schade, Michael J., Bright, Jeffrey J., Mack, George L.
• Granted Patent: US 7,967,978 B2
• Time in Patent Office: Days
• US Class Current: 210/767
• CPC Class Codes: B01D 37/00 Processes of filtration processes specially adapted for filtering gases B01D46/00
• CPC Class Codes: B01D 37/04 Controlling the filtration
• CPC Class Codes: G03F 7/26 Processing photosensitive materials; Apparatus therefor G03F7/12 - G03F7/24 take precedence

Abstract

An apparatus for preconditioning a filter media includes a reservoir containing a liquid; a pump operatively connected and in fluid communication with the reservoir; a filter housing operatively connected and in fluid communication with the reservoir and the pump, and having a filter media disposed therein; a control unit operatively connected to the pump; and wherein the pump is operable to circulate the liquid through the filter media to wet and remove air from the filter media prior to installation of the filter media in a processing application.

Claims

1. An apparatus for preconditioning a filter media, comprising:

a reservoir containing a liquid;

a pump operatively connected and in fluid communication with said reservoir;

a filter housing operatively connected and in fluid communication with said reservoir and said pump, and having a filter media disposed therein;

a control unit operatively connected to said pump; and

wherein said pump is operable to circulate said liquid through the filter media to wet and remove air from the filter media prior to installation of the filter media in a processing application.

2. The apparatus of claim 1, wherein said reservoir, said pump, and said filter housing form a closed circulation system;

and

wherein said liquid is continuously recirculated within said closed circulation system.

3. The apparatus of claim 1, wherein said reservoir, said pump, said filter housing, and said control unit are integrated into a single enclosure.

4. The apparatus of claim 1, wherein said reservoir is configured to accept prepackaged liquid containers.

5. The apparatus of claim 1, wherein said liquid comprises a photoresist solution;

and

wherein said processing application is a photolithographic process.

6. The apparatus of claim 5, wherein said photolithographic process is employed in integrated circuit manufacturing.

7. The apparatus of claim 1, wherein said liquid is a thick film solution for the formation of thick film components;

and

wherein said processing application is integrated circuit manufacturing.

8. The apparatus of claim 1, wherein said liquid is a thin film solution for the formation of thin film components;

and

wherein said processing application is integrated circuit manufacturing.

9. The apparatus of claim 1, wherein said pump is a self-priming pump.

10. The apparatus of claim 1, wherein said control unit is employed to set process parameters;

wherein said process parameters further comprise;

pressure, flow rate, and processing time.

11. The apparatus of claim 1, wherein said control unit is configured to selectively run said pump between a continuous cycle and an intermittent cycle.

12. The apparatus of claim 1, wherein said control unit is operatively connected to sensors attached to said filter housing;

wherein said sensors monitor the preconditioning of said filter media, and provide real-time feedback on the condition of said filter media, and relay a signal to said control unit to automatically deactivate said pump based on the condition of said filter media.

13. An apparatus for preconditioning a filter media for filtering a photoresist solution for use in a photolithographic process that is employed in integrated circuit manufacturing, comprising:

a reservoir containing the photoresist solution;

a pump operatively connected and in fluid communication with said reservoir;

a filter housing operatively connected and in fluid communication with said reservoir and said pump, and having a filter media disposed therein;

a control unit operatively connected to said pump; and

wherein said pump is operable to circulate said photoresist solution through the filter media to wet and remove air from the filter media prior to installation of the filter media in a photolithographic process.

14. A method for preconditioning a filter media, the method comprising:

placing a fluid within a reservoir;

placing the filter media in a filter housing;

setting process parameters with a control unit;

activating a pump to circulate the fluid from the reservoir through the filter disposed in the filter housing;

determining when the filter media has finished being conditioned;

deactivating the pump;

removing the conditioned filter media from the filter housing; and

placing the conditioned filter media in a production process;

wherein the preconditioning of the filter media facilitates the removal of air from the filter media.

15. The method for preconditioning a filter media of claim 14, wherein said setting of the process parameters further comprises setting pressure, flow rate, and processing time.

16. The method for preconditioning a filter media of claim 14, wherein the control unit is configured to selectively run the pump between a continuous cycle and an intermittent cycle.

17. The method for preconditioning a filter media of claim 14, wherein said determining when the filter media has finished being conditioned is established by sensors in electrical contact with the filter housing and the control unit.

18. The method for preconditioning a filter media of claim 14, wherein the fluid is a photoresist.

19. The method for preconditioning a filter media of claim 14, wherein the fluid is a thin film solution.

20. The method for preconditioning a filter media of claim 14, wherein the fluid is a thick film solution.